Electromigration-induced vacancy behavior in unpassivated thin films
| ISSN: |
1089-7550
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|---|---|
| Source: |
AIP Digital Archive
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| Topics: |
Physics
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| Notes: |
A model is constructed where a nonequilibrium vacancy concentration resulting from electromigration-induced mass flux divergences is responsible for damage in the form of wedge-like and/or crack-like voids as well as thinning of extended areas. The damage morphology is primarily a function of temperature.
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| Type of Medium: |
Electronic Resource
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| URL: |