Electron-spin-resonance evidence for an impurity-related E'-like hole trapping defect in thermally grown SiO2 on Si

Conley, John F. ; Lenahan, P. M. ; Evans, H. L. ; Lowry, R. K. ; Morthorst, T. J.

[S.l.] : American Institute of Physics (AIP)
Published 1994
ISSN:
1089-7550
Source:
AIP Digital Archive
Topics:
Physics
Notes:
Using electron spin resonance (ESR), a new electrically active point defect in thermally grown SiO2 films on Si has been detected. The defect has a large capture cross section for electrons when it is paramagnetic and holes when it is diamagnetic (ESR inactive). The g-tensor values, symmetry, and microwave power saturation characteristics are all similar to those of the well-known E' family of amorphous SiO2 defect centers. © 1994 American Institute of Physics.
Type of Medium:
Electronic Resource
URL:
_version_ 1798289651938623488
autor Conley, John F.
Lenahan, P. M.
Evans, H. L.
Lowry, R. K.
Morthorst, T. J.
autorsonst Conley, John F.
Lenahan, P. M.
Evans, H. L.
Lowry, R. K.
Morthorst, T. J.
book_url http://dx.doi.org/10.1063/1.357871
datenlieferant nat_lic_papers
hauptsatz hsatz_simple
identnr NLZ218554249
issn 1089-7550
journal_name Journal of Applied Physics
materialart 1
notes Using electron spin resonance (ESR), a new electrically active point defect in thermally grown SiO2 films on Si has been detected. The defect has a large capture cross section for electrons when it is paramagnetic and holes when it is diamagnetic (ESR inactive). The g-tensor values, symmetry, and microwave power saturation characteristics are all similar to those of the well-known E' family of amorphous SiO2 defect centers. © 1994 American Institute of Physics.
package_name American Institute of Physics (AIP)
publikationsjahr_anzeige 1994
publikationsjahr_facette 1994
publikationsjahr_intervall 8009:1990-1994
publikationsjahr_sort 1994
publikationsort [S.l.]
publisher American Institute of Physics (AIP)
reference 76 (1994), S. 8186-8188
search_space articles
shingle_author_1 Conley, John F.
Lenahan, P. M.
Evans, H. L.
Lowry, R. K.
Morthorst, T. J.
shingle_author_2 Conley, John F.
Lenahan, P. M.
Evans, H. L.
Lowry, R. K.
Morthorst, T. J.
shingle_author_3 Conley, John F.
Lenahan, P. M.
Evans, H. L.
Lowry, R. K.
Morthorst, T. J.
shingle_author_4 Conley, John F.
Lenahan, P. M.
Evans, H. L.
Lowry, R. K.
Morthorst, T. J.
shingle_catch_all_1 Conley, John F.
Lenahan, P. M.
Evans, H. L.
Lowry, R. K.
Morthorst, T. J.
Electron-spin-resonance evidence for an impurity-related E'-like hole trapping defect in thermally grown SiO2 on Si
Using electron spin resonance (ESR), a new electrically active point defect in thermally grown SiO2 films on Si has been detected. The defect has a large capture cross section for electrons when it is paramagnetic and holes when it is diamagnetic (ESR inactive). The g-tensor values, symmetry, and microwave power saturation characteristics are all similar to those of the well-known E' family of amorphous SiO2 defect centers. © 1994 American Institute of Physics.
1089-7550
10897550
American Institute of Physics (AIP)
shingle_catch_all_2 Conley, John F.
Lenahan, P. M.
Evans, H. L.
Lowry, R. K.
Morthorst, T. J.
Electron-spin-resonance evidence for an impurity-related E'-like hole trapping defect in thermally grown SiO2 on Si
Using electron spin resonance (ESR), a new electrically active point defect in thermally grown SiO2 films on Si has been detected. The defect has a large capture cross section for electrons when it is paramagnetic and holes when it is diamagnetic (ESR inactive). The g-tensor values, symmetry, and microwave power saturation characteristics are all similar to those of the well-known E' family of amorphous SiO2 defect centers. © 1994 American Institute of Physics.
1089-7550
10897550
American Institute of Physics (AIP)
shingle_catch_all_3 Conley, John F.
Lenahan, P. M.
Evans, H. L.
Lowry, R. K.
Morthorst, T. J.
Electron-spin-resonance evidence for an impurity-related E'-like hole trapping defect in thermally grown SiO2 on Si
Using electron spin resonance (ESR), a new electrically active point defect in thermally grown SiO2 films on Si has been detected. The defect has a large capture cross section for electrons when it is paramagnetic and holes when it is diamagnetic (ESR inactive). The g-tensor values, symmetry, and microwave power saturation characteristics are all similar to those of the well-known E' family of amorphous SiO2 defect centers. © 1994 American Institute of Physics.
1089-7550
10897550
American Institute of Physics (AIP)
shingle_catch_all_4 Conley, John F.
Lenahan, P. M.
Evans, H. L.
Lowry, R. K.
Morthorst, T. J.
Electron-spin-resonance evidence for an impurity-related E'-like hole trapping defect in thermally grown SiO2 on Si
Using electron spin resonance (ESR), a new electrically active point defect in thermally grown SiO2 films on Si has been detected. The defect has a large capture cross section for electrons when it is paramagnetic and holes when it is diamagnetic (ESR inactive). The g-tensor values, symmetry, and microwave power saturation characteristics are all similar to those of the well-known E' family of amorphous SiO2 defect centers. © 1994 American Institute of Physics.
1089-7550
10897550
American Institute of Physics (AIP)
shingle_title_1 Electron-spin-resonance evidence for an impurity-related E'-like hole trapping defect in thermally grown SiO2 on Si
shingle_title_2 Electron-spin-resonance evidence for an impurity-related E'-like hole trapping defect in thermally grown SiO2 on Si
shingle_title_3 Electron-spin-resonance evidence for an impurity-related E'-like hole trapping defect in thermally grown SiO2 on Si
shingle_title_4 Electron-spin-resonance evidence for an impurity-related E'-like hole trapping defect in thermally grown SiO2 on Si
sigel_instance_filter dkfz
geomar
wilbert
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albert
source_archive AIP Digital Archive
timestamp 2024-05-06T08:04:14.201Z
titel Electron-spin-resonance evidence for an impurity-related E'-like hole trapping defect in thermally grown SiO2 on Si
titel_suche Electron-spin-resonance evidence for an impurity-related E'-like hole trapping defect in thermally grown SiO2 on Si
topic U
uid nat_lic_papers_NLZ218554249