Internal friction in free-standing thin Al films

Heinen, D. ; Bohn, H. G. ; Schilling, W.

[S.l.] : American Institute of Physics (AIP)
Published 1995
ISSN:
1089-7550
Source:
AIP Digital Archive
Topics:
Physics
Notes:
The internal friction of a 4 μm thick free-standing Al film has been investigated. For a measuring frequency of about 200 Hz a relaxation peak was found near 100 °C. Compared with a substrate-bonded film having the same columnar microstructure the peak is about three times higher while the temperature position is the same. This result confirms a model derived for substrate-bonded films which predicts that intrinsic grain boundary sliding controls the relaxation mechanism. The film/substrate-bonding only influences the peak height. It partly hinders the grain boundary sliding thereby reducing the relaxation strength. © 1995 American Institute of Physics.
Type of Medium:
Electronic Resource
URL: