Reliable single-target sputtering process for high-temperature superconducting films and devices
Sandstrom, R. L. ; Gallagher, W. J. ; Dinger, T. R. ; Koch, R. H. ; Laibowitz, R. B. ; Kleinsasser, A. W. ; Gambino, R. J. ; Bumble, B. ; Chisholm, M. F.
Woodbury, NY : American Institute of Physics (AIP)
Published 1988
Woodbury, NY : American Institute of Physics (AIP)
Published 1988
| ISSN: |
1077-3118
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| Source: |
AIP Digital Archive
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| Topics: |
Physics
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| Notes: |
We report a simple, single-target magnetron sputtering process for films of high-temperature superconductors involving an off-axis sputtering geometry. The process lends itself both to film growth with high-temperature post-anneals and to low-temperature in situ film growth. The post-anneal process routinely yields YBa2Cu3O7−x films on SrTiO3 substrates that are fully superconducting at 86–89 K. Current densities at 77 K range from 104 to 8×105 A/cm2. A single-level superconducting quantum interference device (dc SQUID), made by photolithographically patterning a low current density film, has a flux noise level at 77 K of 3×10−4 Φ0/(Hz)1/2 at 20 Hz, dominated by low-frequency noise associated with flux motion in the film.
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| Type of Medium: |
Electronic Resource
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| URL: |