Reliable single-target sputtering process for high-temperature superconducting films and devices - Sandstrom, R. L.; Gallagher, W. J.; Dinger, T. R.; Koch, R. H.; Laibowitz, R. B.; Kleinsasser, A. W.; Gambino, R. J.; Bumble, B.; Chisholm, M. F. (American Institute of Physics (AIP), 1988)
http://dx.doi.org/10.1063/1.100615
Keywords: U