Band gap and band alignment of strain reduced Si/Si1−x−yGexCy multiple quantum well structures obtained by photoluminescence measurements

Hartmann, R. ; Gennser, U. ; Sigg, H. ; Grützmacher, D.

Woodbury, NY : American Institute of Physics (AIP)
Published 1998
ISSN:
1077-3118
Source:
AIP Digital Archive
Topics:
Physics
Notes:
The effect of strain compensation in Si/SiGeC multiple quantum wells (MQWs) is investigated. Photoluminescence measurements on strain-reduced Si/SiGeC layers indicate a type-I band alignment. Values for the conduction-band and valence-band offsets of nearly strain-free Si/SiGeC MQWs are presented. Variation of the strain in the pseudomorphic layers reveals a lowering of the gap energy for exactly strain-compensated SiGeC compared to compressive SiGeC. A model is developed which explains this energy behavior in terms of band offsets and confinement shifts. The band alignments of strain-reduced Si/SiGeC and Si/SiC are compared. © 1998 American Institute of Physics.
Type of Medium:
Electronic Resource
URL:
_version_ 1798289608512897025
autor Hartmann, R.
Gennser, U.
Sigg, H.
Grützmacher, D.
autorsonst Hartmann, R.
Gennser, U.
Sigg, H.
Grützmacher, D.
book_url http://dx.doi.org/10.1063/1.122144
datenlieferant nat_lic_papers
hauptsatz hsatz_simple
identnr NLZ218091427
issn 1077-3118
journal_name Applied Physics Letters
materialart 1
notes The effect of strain compensation in Si/SiGeC multiple quantum wells (MQWs) is investigated. Photoluminescence measurements on strain-reduced Si/SiGeC layers indicate a type-I band alignment. Values for the conduction-band and valence-band offsets of nearly strain-free Si/SiGeC MQWs are presented. Variation of the strain in the pseudomorphic layers reveals a lowering of the gap energy for exactly strain-compensated SiGeC compared to compressive SiGeC. A model is developed which explains this energy behavior in terms of band offsets and confinement shifts. The band alignments of strain-reduced Si/SiGeC and Si/SiC are compared. © 1998 American Institute of Physics.
package_name American Institute of Physics (AIP)
publikationsjahr_anzeige 1998
publikationsjahr_facette 1998
publikationsjahr_intervall 8004:1995-1999
publikationsjahr_sort 1998
publikationsort Woodbury, NY
publisher American Institute of Physics (AIP)
reference 73 (1998), S. 1257-1259
search_space articles
shingle_author_1 Hartmann, R.
Gennser, U.
Sigg, H.
Grützmacher, D.
shingle_author_2 Hartmann, R.
Gennser, U.
Sigg, H.
Grützmacher, D.
shingle_author_3 Hartmann, R.
Gennser, U.
Sigg, H.
Grützmacher, D.
shingle_author_4 Hartmann, R.
Gennser, U.
Sigg, H.
Grützmacher, D.
shingle_catch_all_1 Hartmann, R.
Gennser, U.
Sigg, H.
Grützmacher, D.
Band gap and band alignment of strain reduced Si/Si1−x−yGexCy multiple quantum well structures obtained by photoluminescence measurements
The effect of strain compensation in Si/SiGeC multiple quantum wells (MQWs) is investigated. Photoluminescence measurements on strain-reduced Si/SiGeC layers indicate a type-I band alignment. Values for the conduction-band and valence-band offsets of nearly strain-free Si/SiGeC MQWs are presented. Variation of the strain in the pseudomorphic layers reveals a lowering of the gap energy for exactly strain-compensated SiGeC compared to compressive SiGeC. A model is developed which explains this energy behavior in terms of band offsets and confinement shifts. The band alignments of strain-reduced Si/SiGeC and Si/SiC are compared. © 1998 American Institute of Physics.
1077-3118
10773118
American Institute of Physics (AIP)
shingle_catch_all_2 Hartmann, R.
Gennser, U.
Sigg, H.
Grützmacher, D.
Band gap and band alignment of strain reduced Si/Si1−x−yGexCy multiple quantum well structures obtained by photoluminescence measurements
The effect of strain compensation in Si/SiGeC multiple quantum wells (MQWs) is investigated. Photoluminescence measurements on strain-reduced Si/SiGeC layers indicate a type-I band alignment. Values for the conduction-band and valence-band offsets of nearly strain-free Si/SiGeC MQWs are presented. Variation of the strain in the pseudomorphic layers reveals a lowering of the gap energy for exactly strain-compensated SiGeC compared to compressive SiGeC. A model is developed which explains this energy behavior in terms of band offsets and confinement shifts. The band alignments of strain-reduced Si/SiGeC and Si/SiC are compared. © 1998 American Institute of Physics.
1077-3118
10773118
American Institute of Physics (AIP)
shingle_catch_all_3 Hartmann, R.
Gennser, U.
Sigg, H.
Grützmacher, D.
Band gap and band alignment of strain reduced Si/Si1−x−yGexCy multiple quantum well structures obtained by photoluminescence measurements
The effect of strain compensation in Si/SiGeC multiple quantum wells (MQWs) is investigated. Photoluminescence measurements on strain-reduced Si/SiGeC layers indicate a type-I band alignment. Values for the conduction-band and valence-band offsets of nearly strain-free Si/SiGeC MQWs are presented. Variation of the strain in the pseudomorphic layers reveals a lowering of the gap energy for exactly strain-compensated SiGeC compared to compressive SiGeC. A model is developed which explains this energy behavior in terms of band offsets and confinement shifts. The band alignments of strain-reduced Si/SiGeC and Si/SiC are compared. © 1998 American Institute of Physics.
1077-3118
10773118
American Institute of Physics (AIP)
shingle_catch_all_4 Hartmann, R.
Gennser, U.
Sigg, H.
Grützmacher, D.
Band gap and band alignment of strain reduced Si/Si1−x−yGexCy multiple quantum well structures obtained by photoluminescence measurements
The effect of strain compensation in Si/SiGeC multiple quantum wells (MQWs) is investigated. Photoluminescence measurements on strain-reduced Si/SiGeC layers indicate a type-I band alignment. Values for the conduction-band and valence-band offsets of nearly strain-free Si/SiGeC MQWs are presented. Variation of the strain in the pseudomorphic layers reveals a lowering of the gap energy for exactly strain-compensated SiGeC compared to compressive SiGeC. A model is developed which explains this energy behavior in terms of band offsets and confinement shifts. The band alignments of strain-reduced Si/SiGeC and Si/SiC are compared. © 1998 American Institute of Physics.
1077-3118
10773118
American Institute of Physics (AIP)
shingle_title_1 Band gap and band alignment of strain reduced Si/Si1−x−yGexCy multiple quantum well structures obtained by photoluminescence measurements
shingle_title_2 Band gap and band alignment of strain reduced Si/Si1−x−yGexCy multiple quantum well structures obtained by photoluminescence measurements
shingle_title_3 Band gap and band alignment of strain reduced Si/Si1−x−yGexCy multiple quantum well structures obtained by photoluminescence measurements
shingle_title_4 Band gap and band alignment of strain reduced Si/Si1−x−yGexCy multiple quantum well structures obtained by photoluminescence measurements
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source_archive AIP Digital Archive
timestamp 2024-05-06T08:03:30.427Z
titel Band gap and band alignment of strain reduced Si/Si1−x−yGexCy multiple quantum well structures obtained by photoluminescence measurements
titel_suche Band gap and band alignment of strain reduced Si/Si1−x−yGexCy multiple quantum well structures obtained by photoluminescence measurements
topic U
uid nat_lic_papers_NLZ218091427