Simulation of the turn-on transient behavior of amorphous-silicon thin-film transistors

Luo, F. ; Neudeck, G.W. ; Luan, S.

Amsterdam : Elsevier
ISSN:
0038-1101
Source:
Elsevier Journal Backfiles on ScienceDirect 1907 - 2002
Topics:
Electrical Engineering, Measurement and Control Technology
Physics
Type of Medium:
Electronic Resource
URL:
_version_ 1798291278844133379
autor Luo, F.
Neudeck, G.W.
Luan, S.
autorsonst Luo, F.
Neudeck, G.W.
Luan, S.
book_url http://linkinghub.elsevier.com/retrieve/pii/0038-1101(91)90070-F
datenlieferant nat_lic_papers
fussnote The turn-on transient behavior of amorphous-silicon (a-Si:H) thin-film transistors (TFT) was measured. The source current decay, after the initial step, had a double exponential decay within the first 6 ms. The source-current decay rate did not depend on the drain voltage, gate voltage or geometry of the device. In this study a modeling methodology based on a table look-up procedure was used to simulate the turn-on transient behavior of the a-Si:H TFT. Based on experimental evidence, the original five look-up tables were simplified to two tables. The simplified set of two tables was used to simulate the long-term transient behavior and yielded good agreement with the experimental results.
hauptsatz hsatz_simple
identnr NLZ179507974
iqvoc_descriptor_title iqvoc_00000786:Simulation
iqvoc_00000627:transistors
issn 0038-1101
journal_name Solid State Electronics
materialart 1
package_name Elsevier
publikationsort Amsterdam
publisher Elsevier
reference 34 (1991), S. 1289-1295
search_space articles
shingle_author_1 Luo, F.
Neudeck, G.W.
Luan, S.
shingle_author_2 Luo, F.
Neudeck, G.W.
Luan, S.
shingle_author_3 Luo, F.
Neudeck, G.W.
Luan, S.
shingle_author_4 Luo, F.
Neudeck, G.W.
Luan, S.
shingle_catch_all_1 Luo, F.
Neudeck, G.W.
Luan, S.
Simulation of the turn-on transient behavior of amorphous-silicon thin-film transistors
0038-1101
00381101
Elsevier
shingle_catch_all_2 Luo, F.
Neudeck, G.W.
Luan, S.
Simulation of the turn-on transient behavior of amorphous-silicon thin-film transistors
0038-1101
00381101
Elsevier
shingle_catch_all_3 Luo, F.
Neudeck, G.W.
Luan, S.
Simulation of the turn-on transient behavior of amorphous-silicon thin-film transistors
0038-1101
00381101
Elsevier
shingle_catch_all_4 Luo, F.
Neudeck, G.W.
Luan, S.
Simulation of the turn-on transient behavior of amorphous-silicon thin-film transistors
0038-1101
00381101
Elsevier
shingle_title_1 Simulation of the turn-on transient behavior of amorphous-silicon thin-film transistors
shingle_title_2 Simulation of the turn-on transient behavior of amorphous-silicon thin-film transistors
shingle_title_3 Simulation of the turn-on transient behavior of amorphous-silicon thin-film transistors
shingle_title_4 Simulation of the turn-on transient behavior of amorphous-silicon thin-film transistors
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wilbert
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albert
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source_archive Elsevier Journal Backfiles on ScienceDirect 1907 - 2002
timestamp 2024-05-06T08:30:05.773Z
titel Simulation of the turn-on transient behavior of amorphous-silicon thin-film transistors
titel_suche Simulation of the turn-on transient behavior of amorphous-silicon thin-film transistors
The turn-on transient behavior of amorphous-silicon (a-Si:H) thin-film transistors (TFT) was measured. The source current decay, after the initial step, had a double exponential decay within the first 6 ms. The source-current decay rate did not depend on the drain voltage, gate voltage or geometry of the device. In this study a modeling methodology based on a table look-up procedure was used to simulate the turn-on transient behavior of the a-Si:H TFT. Based on experimental evidence, the original five look-up tables were simplified to two tables. The simplified set of two tables was used to simulate the long-term transient behavior and yielded good agreement with the experimental results.
topic ZN
U
uid nat_lic_papers_NLZ179507974