Raman study of WO"3 thin films
| ISSN: |
0167-2738
|
|---|---|
| Source: |
Elsevier Journal Backfiles on ScienceDirect 1907 - 2002
|
| Topics: |
Physics
|
| Type of Medium: |
Electronic Resource
|
| URL: |
| _version_ | 1798291632728047616 |
|---|---|
| autor | Thi, M.P. Velasco, G. |
| autorsonst | Thi, M.P. Velasco, G. |
| book_url | http://linkinghub.elsevier.com/retrieve/pii/0167-2738(84)90101-2 |
| datenlieferant | nat_lic_papers |
| fussnote | The influence of substrates, thermal treatment and coloration-bleaching cycles on the structure of WO"3 thin films used in electrochromic devices has been investigated by Raman microscopy. Films (2000-8000 Å) were prepared by RF sputtering from a metallic tungsten target at a constant pressure (5 x 10^-^3 Torr) of pure oxygen or a mixture of Ar20% O"2. They are amorphous, transparent and electrochromic. Thermal treatment at 360^oC produces crystallization. Modifications of the WO"3 framework are also induced by coloration-bleaching cycles. |
| hauptsatz | hsatz_simple |
| identnr | NLZ17878222X |
| issn | 0167-2738 |
| journal_name | Solid State Ionics |
| materialart | 1 |
| package_name | Elsevier |
| publikationsort | Amsterdam |
| publisher | Elsevier |
| reference | 14 (1984), S. 217-220 |
| search_space | articles |
| shingle_author_1 | Thi, M.P. Velasco, G. |
| shingle_author_2 | Thi, M.P. Velasco, G. |
| shingle_author_3 | Thi, M.P. Velasco, G. |
| shingle_author_4 | Thi, M.P. Velasco, G. |
| shingle_catch_all_1 | Thi, M.P. Velasco, G. Raman study of WO"3 thin films 0167-2738 01672738 Elsevier |
| shingle_catch_all_2 | Thi, M.P. Velasco, G. Raman study of WO"3 thin films 0167-2738 01672738 Elsevier |
| shingle_catch_all_3 | Thi, M.P. Velasco, G. Raman study of WO"3 thin films 0167-2738 01672738 Elsevier |
| shingle_catch_all_4 | Thi, M.P. Velasco, G. Raman study of WO"3 thin films 0167-2738 01672738 Elsevier |
| shingle_title_1 | Raman study of WO"3 thin films |
| shingle_title_2 | Raman study of WO"3 thin films |
| shingle_title_3 | Raman study of WO"3 thin films |
| shingle_title_4 | Raman study of WO"3 thin films |
| sigel_instance_filter | dkfz geomar wilbert ipn albert fhp |
| source_archive | Elsevier Journal Backfiles on ScienceDirect 1907 - 2002 |
| timestamp | 2024-05-06T08:35:43.108Z |
| titel | Raman study of WO"3 thin films |
| titel_suche | Raman study of WO"3 thin films The influence of substrates, thermal treatment and coloration-bleaching cycles on the structure of WO"3 thin films used in electrochromic devices has been investigated by Raman microscopy. Films (2000-8000 Å) were prepared by RF sputtering from a metallic tungsten target at a constant pressure (5 x 10^-^3 Torr) of pure oxygen or a mixture of Ar20% O"2. They are amorphous, transparent and electrochromic. Thermal treatment at 360^oC produces crystallization. Modifications of the WO"3 framework are also induced by coloration-bleaching cycles. |
| topic | U |
| uid | nat_lic_papers_NLZ17878222X |