Raman study of WO"3 thin films - Thi, M.P.; Velasco, G. (Elsevier)
The influence of substrates, thermal treatment and coloration-bleaching cycles on the structure of WO"3 thin films used in electrochromic devices has been investigated by Raman microscopy. Films (2000-8000 Å) were prepared by RF sputtering from a metallic tungsten target at a constant pressure (5 x 10^-^3 Torr) of pure oxygen or a mixture of Ar20% O"2. They are amorphous, transparent and electrochromic. Thermal treatment at 360^oC produces crystallization. Modifications of the WO"3 framework are also induced by coloration-bleaching cycles.
http://linkinghub.elsevier.com/retrieve/pii/0167-2738(84)90101-2
Keywords: U