Silicon nitride films deposited from SiH"2Cl"2NH"3 by low pressure chemical vapor deposition: kinetics, thermodynamics, composition and structure

Zhang, S.-L. ; Wang, J.-T. ; Kaplan, W. ; Ostling, M.

Amsterdam : Elsevier

ISSN:	0040-6090
Source:	Elsevier Journal Backfiles on ScienceDirect 1907 - 2002
Topics:	Physics
Type of Medium:	Electronic Resource
URL:	http://linkinghub.elsevier.com/retrieve/pii/0040-6090(92)90281-F