Zhang, S., Wang, J., Kaplan, W., & Ostling, M. Silicon nitride films deposited from SiH"2Cl"2NH"3 by low pressure chemical vapor deposition: Kinetics, thermodynamics, composition and structure. Elsevier.
Chicago Style (17th ed.) CitationZhang, S.-L, J.-T Wang, W. Kaplan, and M. Ostling. Silicon Nitride Films Deposited from SiH"2Cl"2NH"3 by Low Pressure Chemical Vapor Deposition: Kinetics, Thermodynamics, Composition and Structure. Amsterdam: Elsevier.
MLA (9th ed.) CitationZhang, S.-L, et al. Silicon Nitride Films Deposited from SiH"2Cl"2NH"3 by Low Pressure Chemical Vapor Deposition: Kinetics, Thermodynamics, Composition and Structure. Elsevier.
Warning: These citations may not always be 100% accurate.