The formation of resist profile by TMSDEA-treatment and dry development based on oxygen-helium RIE

ISSN:
0167-9317
Source:
Elsevier Journal Backfiles on ScienceDirect 1907 - 2002
Topics:
Electrical Engineering, Measurement and Control Technology
Type of Medium:
Electronic Resource
URL:
http://linkinghub.elsevier.com/retrieve/pii/0167-9317(91)90060-Q