Quantum yield for poly(methyl methacrylate) chain scission by 214-229 nm wavelength light
Shultz, A. R. ; Frank, P. ; Griffing, B. F. ; Young, A. L.
New York : Wiley-Blackwell
Published 1985
New York : Wiley-Blackwell
Published 1985
| ISSN: |
0098-1273
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|---|---|
| Keywords: |
Physics ; Polymer and Materials Science
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| Source: |
Wiley InterScience Backfile Collection 1832-2000
|
| Topics: |
Chemistry and Pharmacology
Physics
|
| Notes: |
The quantum yield for poly(methyl methacrylate)chain scission by ultraviolet light in the 214-229 nm wavelength region was found to be φd = 0.03 scissions per absorbed photon. Samples were 1.65-μm films spun cast on silicon wafers and irradiated under flowing nitrogen by a cadmium vapor lamp. Gel permeation chromatography was used for molecular weight determination. Heating (postbaking) the irradiated films at 150°C for one hour under reduced-pressure flowing nitrogen increased the observed scissions per absorbed photon to 0.04. Glass transition temperatures by DSC are well-represented by Tg (K) = 393.3 - 2.0 × 105/Mn for the postbaked samples (139,000 〉 Mn 〉 6500).
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| Additional Material: |
4 Ill.
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| Type of Medium: |
Electronic Resource
|
| URL: |
| _version_ | 1798298143747473408 |
|---|---|
| addmaterial | 4 Ill. |
| autor | Shultz, A. R. Frank, P. Griffing, B. F. Young, A. L. |
| autorsonst | Shultz, A. R. Frank, P. Griffing, B. F. Young, A. L. |
| book_url | http://dx.doi.org/10.1002/pol.1985.180230902 |
| datenlieferant | nat_lic_papers |
| hauptsatz | hsatz_simple |
| identnr | NLM16391625X |
| iqvoc_descriptor_keyword | iqvoc_00000092:Materials |
| issn | 0098-1273 |
| journal_name | Journal of Polymer Science: Polymer Physics Edition |
| materialart | 1 |
| notes | The quantum yield for poly(methyl methacrylate)chain scission by ultraviolet light in the 214-229 nm wavelength region was found to be φd = 0.03 scissions per absorbed photon. Samples were 1.65-μm films spun cast on silicon wafers and irradiated under flowing nitrogen by a cadmium vapor lamp. Gel permeation chromatography was used for molecular weight determination. Heating (postbaking) the irradiated films at 150°C for one hour under reduced-pressure flowing nitrogen increased the observed scissions per absorbed photon to 0.04. Glass transition temperatures by DSC are well-represented by Tg (K) = 393.3 - 2.0 × 105/Mn for the postbaked samples (139,000 〉 Mn 〉 6500). |
| package_name | Wiley-Blackwell |
| publikationsjahr_anzeige | 1985 |
| publikationsjahr_facette | 1985 |
| publikationsjahr_intervall | 8014:1985-1989 |
| publikationsjahr_sort | 1985 |
| publikationsort | New York |
| publisher | Wiley-Blackwell |
| reference | 23 (1985), S. 1749-1758 |
| schlagwort | Physics Polymer and Materials Science |
| search_space | articles |
| shingle_author_1 | Shultz, A. R. Frank, P. Griffing, B. F. Young, A. L. |
| shingle_author_2 | Shultz, A. R. Frank, P. Griffing, B. F. Young, A. L. |
| shingle_author_3 | Shultz, A. R. Frank, P. Griffing, B. F. Young, A. L. |
| shingle_author_4 | Shultz, A. R. Frank, P. Griffing, B. F. Young, A. L. |
| shingle_catch_all_1 | Shultz, A. R. Frank, P. Griffing, B. F. Young, A. L. Quantum yield for poly(methyl methacrylate) chain scission by 214-229 nm wavelength light Physics Polymer and Materials Science Physics Polymer and Materials Science The quantum yield for poly(methyl methacrylate)chain scission by ultraviolet light in the 214-229 nm wavelength region was found to be φd = 0.03 scissions per absorbed photon. Samples were 1.65-μm films spun cast on silicon wafers and irradiated under flowing nitrogen by a cadmium vapor lamp. Gel permeation chromatography was used for molecular weight determination. Heating (postbaking) the irradiated films at 150°C for one hour under reduced-pressure flowing nitrogen increased the observed scissions per absorbed photon to 0.04. Glass transition temperatures by DSC are well-represented by Tg (K) = 393.3 - 2.0 × 105/Mn for the postbaked samples (139,000 〉 Mn 〉 6500). 0098-1273 00981273 Wiley-Blackwell |
| shingle_catch_all_2 | Shultz, A. R. Frank, P. Griffing, B. F. Young, A. L. Quantum yield for poly(methyl methacrylate) chain scission by 214-229 nm wavelength light Physics Polymer and Materials Science Physics Polymer and Materials Science The quantum yield for poly(methyl methacrylate)chain scission by ultraviolet light in the 214-229 nm wavelength region was found to be φd = 0.03 scissions per absorbed photon. Samples were 1.65-μm films spun cast on silicon wafers and irradiated under flowing nitrogen by a cadmium vapor lamp. Gel permeation chromatography was used for molecular weight determination. Heating (postbaking) the irradiated films at 150°C for one hour under reduced-pressure flowing nitrogen increased the observed scissions per absorbed photon to 0.04. Glass transition temperatures by DSC are well-represented by Tg (K) = 393.3 - 2.0 × 105/Mn for the postbaked samples (139,000 〉 Mn 〉 6500). 0098-1273 00981273 Wiley-Blackwell |
| shingle_catch_all_3 | Shultz, A. R. Frank, P. Griffing, B. F. Young, A. L. Quantum yield for poly(methyl methacrylate) chain scission by 214-229 nm wavelength light Physics Polymer and Materials Science Physics Polymer and Materials Science The quantum yield for poly(methyl methacrylate)chain scission by ultraviolet light in the 214-229 nm wavelength region was found to be φd = 0.03 scissions per absorbed photon. Samples were 1.65-μm films spun cast on silicon wafers and irradiated under flowing nitrogen by a cadmium vapor lamp. Gel permeation chromatography was used for molecular weight determination. Heating (postbaking) the irradiated films at 150°C for one hour under reduced-pressure flowing nitrogen increased the observed scissions per absorbed photon to 0.04. Glass transition temperatures by DSC are well-represented by Tg (K) = 393.3 - 2.0 × 105/Mn for the postbaked samples (139,000 〉 Mn 〉 6500). 0098-1273 00981273 Wiley-Blackwell |
| shingle_catch_all_4 | Shultz, A. R. Frank, P. Griffing, B. F. Young, A. L. Quantum yield for poly(methyl methacrylate) chain scission by 214-229 nm wavelength light Physics Polymer and Materials Science Physics Polymer and Materials Science The quantum yield for poly(methyl methacrylate)chain scission by ultraviolet light in the 214-229 nm wavelength region was found to be φd = 0.03 scissions per absorbed photon. Samples were 1.65-μm films spun cast on silicon wafers and irradiated under flowing nitrogen by a cadmium vapor lamp. Gel permeation chromatography was used for molecular weight determination. Heating (postbaking) the irradiated films at 150°C for one hour under reduced-pressure flowing nitrogen increased the observed scissions per absorbed photon to 0.04. Glass transition temperatures by DSC are well-represented by Tg (K) = 393.3 - 2.0 × 105/Mn for the postbaked samples (139,000 〉 Mn 〉 6500). 0098-1273 00981273 Wiley-Blackwell |
| shingle_title_1 | Quantum yield for poly(methyl methacrylate) chain scission by 214-229 nm wavelength light |
| shingle_title_2 | Quantum yield for poly(methyl methacrylate) chain scission by 214-229 nm wavelength light |
| shingle_title_3 | Quantum yield for poly(methyl methacrylate) chain scission by 214-229 nm wavelength light |
| shingle_title_4 | Quantum yield for poly(methyl methacrylate) chain scission by 214-229 nm wavelength light |
| sigel_instance_filter | dkfz geomar wilbert ipn albert |
| source_archive | Wiley InterScience Backfile Collection 1832-2000 |
| timestamp | 2024-05-06T10:19:10.960Z |
| titel | Quantum yield for poly(methyl methacrylate) chain scission by 214-229 nm wavelength light |
| titel_suche | Quantum yield for poly(methyl methacrylate) chain scission by 214-229 nm wavelength light |
| topic | V U |
| uid | nat_lic_papers_NLM16391625X |