Quantum yield for poly(methyl methacrylate) chain scission by 214-229 nm wavelength light
Shultz, A. R. ; Frank, P. ; Griffing, B. F. ; Young, A. L.
New York : Wiley-Blackwell
Published 1985
New York : Wiley-Blackwell
Published 1985
| ISSN: |
0098-1273
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|---|---|
| Keywords: |
Physics ; Polymer and Materials Science
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| Source: |
Wiley InterScience Backfile Collection 1832-2000
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| Topics: |
Chemistry and Pharmacology
Physics
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| Notes: |
The quantum yield for poly(methyl methacrylate)chain scission by ultraviolet light in the 214-229 nm wavelength region was found to be φd = 0.03 scissions per absorbed photon. Samples were 1.65-μm films spun cast on silicon wafers and irradiated under flowing nitrogen by a cadmium vapor lamp. Gel permeation chromatography was used for molecular weight determination. Heating (postbaking) the irradiated films at 150°C for one hour under reduced-pressure flowing nitrogen increased the observed scissions per absorbed photon to 0.04. Glass transition temperatures by DSC are well-represented by Tg (K) = 393.3 - 2.0 × 105/Mn for the postbaked samples (139,000 〉 Mn 〉 6500).
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| Additional Material: |
4 Ill.
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| Type of Medium: |
Electronic Resource
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| URL: |