An investigation of surface segregation in magnetron-sputtered NbSi using UPS and AES
Hucknall, P. K. ; Walker, C. G. H. ; Greig, D. ; Matthew, J. A. D. ; Norman, D. ; Turton, J.
Chichester [u.a.] : Wiley-Blackwell
Published 1992
Chichester [u.a.] : Wiley-Blackwell
Published 1992
| ISSN: |
0142-2421
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| Keywords: |
Chemistry ; Polymer and Materials Science
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| Source: |
Wiley InterScience Backfile Collection 1832-2000
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| Topics: |
Physics
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| Notes: |
Films of amorphous NbSi prepared by magnetron sputtering were found to have a higher concentration of silicon at the surface than in the bulk material. In this paper we report on measurements of both ultraviolet photoemission spectroscopy and Auger electron spectroscopy carried out on samples prepared in situ at the UK Synchrotron Radiation Source, Daresbury. Spectr taken immediately after sputter deposition show that the surface is rich in silicon, while following argon ion bombardment the bulk composition is slowly revealed with a much greater concentration of niobium. This is observed by a comparison of the relative heights of peaks in the Auger spectra and by resonance effects and the sharpening of the Fermi edge in the UP spectra. Of particular interest are changes around the metal-insulator transition that occur at approximately 11 at.% niobium.
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| Additional Material: |
4 Ill.
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| Type of Medium: |
Electronic Resource
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| URL: |