An investigation of surface segregation in magnetron-sputtered NbSi using UPS and AES

Hucknall, P. K. ; Walker, C. G. H. ; Greig, D. ; Matthew, J. A. D. ; Norman, D. ; Turton, J.

Chichester [u.a.] : Wiley-Blackwell
Published 1992
ISSN:
0142-2421
Keywords:
Chemistry ; Polymer and Materials Science
Source:
Wiley InterScience Backfile Collection 1832-2000
Topics:
Physics
Notes:
Films of amorphous NbSi prepared by magnetron sputtering were found to have a higher concentration of silicon at the surface than in the bulk material. In this paper we report on measurements of both ultraviolet photoemission spectroscopy and Auger electron spectroscopy carried out on samples prepared in situ at the UK Synchrotron Radiation Source, Daresbury. Spectr taken immediately after sputter deposition show that the surface is rich in silicon, while following argon ion bombardment the bulk composition is slowly revealed with a much greater concentration of niobium. This is observed by a comparison of the relative heights of peaks in the Auger spectra and by resonance effects and the sharpening of the Fermi edge in the UP spectra. Of particular interest are changes around the metal-insulator transition that occur at approximately 11 at.% niobium.
Additional Material:
4 Ill.
Type of Medium:
Electronic Resource
URL:
_version_ 1798298147641884673
addmaterial 4 Ill.
autor Hucknall, P. K.
Walker, C. G. H.
Greig, D.
Matthew, J. A. D.
Norman, D.
Turton, J.
autorsonst Hucknall, P. K.
Walker, C. G. H.
Greig, D.
Matthew, J. A. D.
Norman, D.
Turton, J.
book_url http://dx.doi.org/10.1002/sia.740190108
datenlieferant nat_lic_papers
hauptsatz hsatz_simple
identnr NLM160289580
iqvoc_descriptor_keyword iqvoc_00000092:Materials
issn 0142-2421
journal_name Surface and Interface Analysis
materialart 1
notes Films of amorphous NbSi prepared by magnetron sputtering were found to have a higher concentration of silicon at the surface than in the bulk material. In this paper we report on measurements of both ultraviolet photoemission spectroscopy and Auger electron spectroscopy carried out on samples prepared in situ at the UK Synchrotron Radiation Source, Daresbury. Spectr taken immediately after sputter deposition show that the surface is rich in silicon, while following argon ion bombardment the bulk composition is slowly revealed with a much greater concentration of niobium. This is observed by a comparison of the relative heights of peaks in the Auger spectra and by resonance effects and the sharpening of the Fermi edge in the UP spectra. Of particular interest are changes around the metal-insulator transition that occur at approximately 11 at.% niobium.
package_name Wiley-Blackwell
publikationsjahr_anzeige 1992
publikationsjahr_facette 1992
publikationsjahr_intervall 8009:1990-1994
publikationsjahr_sort 1992
publikationsort Chichester [u.a.]
publisher Wiley-Blackwell
reference 19 (1992), S. 23-26
schlagwort Chemistry
Polymer and Materials Science
search_space articles
shingle_author_1 Hucknall, P. K.
Walker, C. G. H.
Greig, D.
Matthew, J. A. D.
Norman, D.
Turton, J.
shingle_author_2 Hucknall, P. K.
Walker, C. G. H.
Greig, D.
Matthew, J. A. D.
Norman, D.
Turton, J.
shingle_author_3 Hucknall, P. K.
Walker, C. G. H.
Greig, D.
Matthew, J. A. D.
Norman, D.
Turton, J.
shingle_author_4 Hucknall, P. K.
Walker, C. G. H.
Greig, D.
Matthew, J. A. D.
Norman, D.
Turton, J.
shingle_catch_all_1 Hucknall, P. K.
Walker, C. G. H.
Greig, D.
Matthew, J. A. D.
Norman, D.
Turton, J.
An investigation of surface segregation in magnetron-sputtered NbSi using UPS and AES
Chemistry
Polymer and Materials Science
Chemistry
Polymer and Materials Science
Films of amorphous NbSi prepared by magnetron sputtering were found to have a higher concentration of silicon at the surface than in the bulk material. In this paper we report on measurements of both ultraviolet photoemission spectroscopy and Auger electron spectroscopy carried out on samples prepared in situ at the UK Synchrotron Radiation Source, Daresbury. Spectr taken immediately after sputter deposition show that the surface is rich in silicon, while following argon ion bombardment the bulk composition is slowly revealed with a much greater concentration of niobium. This is observed by a comparison of the relative heights of peaks in the Auger spectra and by resonance effects and the sharpening of the Fermi edge in the UP spectra. Of particular interest are changes around the metal-insulator transition that occur at approximately 11 at.% niobium.
0142-2421
01422421
Wiley-Blackwell
shingle_catch_all_2 Hucknall, P. K.
Walker, C. G. H.
Greig, D.
Matthew, J. A. D.
Norman, D.
Turton, J.
An investigation of surface segregation in magnetron-sputtered NbSi using UPS and AES
Chemistry
Polymer and Materials Science
Chemistry
Polymer and Materials Science
Films of amorphous NbSi prepared by magnetron sputtering were found to have a higher concentration of silicon at the surface than in the bulk material. In this paper we report on measurements of both ultraviolet photoemission spectroscopy and Auger electron spectroscopy carried out on samples prepared in situ at the UK Synchrotron Radiation Source, Daresbury. Spectr taken immediately after sputter deposition show that the surface is rich in silicon, while following argon ion bombardment the bulk composition is slowly revealed with a much greater concentration of niobium. This is observed by a comparison of the relative heights of peaks in the Auger spectra and by resonance effects and the sharpening of the Fermi edge in the UP spectra. Of particular interest are changes around the metal-insulator transition that occur at approximately 11 at.% niobium.
0142-2421
01422421
Wiley-Blackwell
shingle_catch_all_3 Hucknall, P. K.
Walker, C. G. H.
Greig, D.
Matthew, J. A. D.
Norman, D.
Turton, J.
An investigation of surface segregation in magnetron-sputtered NbSi using UPS and AES
Chemistry
Polymer and Materials Science
Chemistry
Polymer and Materials Science
Films of amorphous NbSi prepared by magnetron sputtering were found to have a higher concentration of silicon at the surface than in the bulk material. In this paper we report on measurements of both ultraviolet photoemission spectroscopy and Auger electron spectroscopy carried out on samples prepared in situ at the UK Synchrotron Radiation Source, Daresbury. Spectr taken immediately after sputter deposition show that the surface is rich in silicon, while following argon ion bombardment the bulk composition is slowly revealed with a much greater concentration of niobium. This is observed by a comparison of the relative heights of peaks in the Auger spectra and by resonance effects and the sharpening of the Fermi edge in the UP spectra. Of particular interest are changes around the metal-insulator transition that occur at approximately 11 at.% niobium.
0142-2421
01422421
Wiley-Blackwell
shingle_catch_all_4 Hucknall, P. K.
Walker, C. G. H.
Greig, D.
Matthew, J. A. D.
Norman, D.
Turton, J.
An investigation of surface segregation in magnetron-sputtered NbSi using UPS and AES
Chemistry
Polymer and Materials Science
Chemistry
Polymer and Materials Science
Films of amorphous NbSi prepared by magnetron sputtering were found to have a higher concentration of silicon at the surface than in the bulk material. In this paper we report on measurements of both ultraviolet photoemission spectroscopy and Auger electron spectroscopy carried out on samples prepared in situ at the UK Synchrotron Radiation Source, Daresbury. Spectr taken immediately after sputter deposition show that the surface is rich in silicon, while following argon ion bombardment the bulk composition is slowly revealed with a much greater concentration of niobium. This is observed by a comparison of the relative heights of peaks in the Auger spectra and by resonance effects and the sharpening of the Fermi edge in the UP spectra. Of particular interest are changes around the metal-insulator transition that occur at approximately 11 at.% niobium.
0142-2421
01422421
Wiley-Blackwell
shingle_title_1 An investigation of surface segregation in magnetron-sputtered NbSi using UPS and AES
shingle_title_2 An investigation of surface segregation in magnetron-sputtered NbSi using UPS and AES
shingle_title_3 An investigation of surface segregation in magnetron-sputtered NbSi using UPS and AES
shingle_title_4 An investigation of surface segregation in magnetron-sputtered NbSi using UPS and AES
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source_archive Wiley InterScience Backfile Collection 1832-2000
timestamp 2024-05-06T10:19:15.994Z
titel An investigation of surface segregation in magnetron-sputtered NbSi using UPS and AES
titel_suche An investigation of surface segregation in magnetron-sputtered NbSi using UPS and AES
topic U
uid nat_lic_papers_NLM160289580