In Situ Measurement of Capacitance: A Method for Fabricating Nanoglass
Ohta, Y. ; Kitayama, M. ; Kaneko, K. ; Toh, S. ; Shimizu, F. ; Morinaga, K.
Oxford, UK : Blackwell Science Inc
Published 2005
Oxford, UK : Blackwell Science Inc
Published 2005
| ISSN: |
1551-2916
|
|---|---|
| Source: |
Blackwell Publishing Journal Backfiles 1879-2005
|
| Topics: |
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
Physics
|
| Notes: |
The capacitance of the Na2O–SiO2 glass was measured in situ during heat treatment at various frequencies, 20, 100, 1, 3, 10, and 30 kHz. It was found that the capacitance of the glass abruptly decreases after a certain duration. The glass was quenched at this stage. It was confirmed by the X-ray diffraction and transmission electron microscopy that this decrease of capacitance was associated with the formation of crystallites in the glass matrix. The size of crystallites was observed to be in the range of about 10 nm.
|
| Type of Medium: |
Electronic Resource
|
| URL: |