High-resolution low-voltage electron optical system for very large specimens
ISSN: |
1089-7623
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Source: |
AIP Digital Archive
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Topics: |
Physics
Electrical Engineering, Measurement and Control Technology
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Notes: |
This article introduces an unconventional electron optical probe forming system which is particularly suitable for low beam voltages and very large specimens, such as semiconductor wafers which also require a large angle tilting. The system can produce an electron probe of less than 20 A(ring) for a nontilting specimen at 1-kV beam voltage with a working distance of 2.5 mm. The particular design allows a large volume of free space below the specimen which may be used to accommodate a complicated transporting mechanism.
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Type of Medium: |
Electronic Resource
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URL: |