Ishiguro, E., Yamashita, K., Ohashi, H., Sakurai, M., Aita, O., Watanabe, M., . . . Nagano, T. (1992). Fabrication and characterization of reactive ion beam etched SiC gratings: Proceedings of the 4th international conference on synchrotron radiation instrumentation. American Institute of Physics (AIP).
Chicago Style (17th ed.) CitationIshiguro, E., K. Yamashita, H. Ohashi, M. Sakurai, O. Aita, M. Watanabe, K. Sano, M. Koeda, and T. Nagano. Fabrication and Characterization of Reactive Ion Beam Etched SiC Gratings: Proceedings of the 4th International Conference on Synchrotron Radiation Instrumentation. [S.l.]: American Institute of Physics (AIP), 1992.
MLA (9th ed.) CitationIshiguro, E., et al. Fabrication and Characterization of Reactive Ion Beam Etched SiC Gratings: Proceedings of the 4th International Conference on Synchrotron Radiation Instrumentation. American Institute of Physics (AIP), 1992.