Ultrahigh vacuum chamber for synchrotron x-ray diffraction from films adsorbed on single-crystal surfaces
Dennison, J. R. ; Wang, S.-K. ; Dai, P. ; Angot, T. ; Taub, H. ; Ehrlich, S. N.
[S.l.] : American Institute of Physics (AIP)
Published 1992
[S.l.] : American Institute of Physics (AIP)
Published 1992
| ISSN: |
1089-7623
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|---|---|
| Source: |
AIP Digital Archive
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| Topics: |
Physics
Electrical Engineering, Measurement and Control Technology
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| Notes: |
An ultrahigh vacuum chamber has been developed for structural analysis of adsorbed films and single-crystal surfaces using synchrotron x-ray diffraction. It is particularly well suited for investigations of physisorbed and other weakly bound films. The chamber is small enough to transport and mount directly on a standard four-axis diffractometer and can also be used independently of the x-ray diffractometer. A low-current, pulse-counting, low-energy electron diffraction/Auger spectroscopy system with a position-sensitive detector enables in situ characterization of the film and substrate while the sample is located at the x-ray scattering position. A closed-cycle He refrigerator and electron bombardment heater provide controlled substrate temperatures from 30 to 1300 K. The chamber is also equipped with an ion sputter gun, a quadrupole mass spectrometer, and a gas handling system. Details of the design and operation of the instrument are described. To demonstrate the performance of the instrument, we present some preliminary results of a study of Xe physisorbed on the Ag(111) surface.
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| Type of Medium: |
Electronic Resource
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| URL: |
| _version_ | 1798289703100743680 |
|---|---|
| autor | Dennison, J. R. Wang, S.-K. Dai, P. Angot, T. Taub, H. Ehrlich, S. N. |
| autorsonst | Dennison, J. R. Wang, S.-K. Dai, P. Angot, T. Taub, H. Ehrlich, S. N. |
| book_url | http://dx.doi.org/10.1063/1.1143279 |
| datenlieferant | nat_lic_papers |
| hauptsatz | hsatz_simple |
| identnr | NLZ219478538 |
| issn | 1089-7623 |
| journal_name | Review of Scientific Instruments |
| materialart | 1 |
| notes | An ultrahigh vacuum chamber has been developed for structural analysis of adsorbed films and single-crystal surfaces using synchrotron x-ray diffraction. It is particularly well suited for investigations of physisorbed and other weakly bound films. The chamber is small enough to transport and mount directly on a standard four-axis diffractometer and can also be used independently of the x-ray diffractometer. A low-current, pulse-counting, low-energy electron diffraction/Auger spectroscopy system with a position-sensitive detector enables in situ characterization of the film and substrate while the sample is located at the x-ray scattering position. A closed-cycle He refrigerator and electron bombardment heater provide controlled substrate temperatures from 30 to 1300 K. The chamber is also equipped with an ion sputter gun, a quadrupole mass spectrometer, and a gas handling system. Details of the design and operation of the instrument are described. To demonstrate the performance of the instrument, we present some preliminary results of a study of Xe physisorbed on the Ag(111) surface. |
| package_name | American Institute of Physics (AIP) |
| publikationsjahr_anzeige | 1992 |
| publikationsjahr_facette | 1992 |
| publikationsjahr_intervall | 8009:1990-1994 |
| publikationsjahr_sort | 1992 |
| publikationsort | [S.l.] |
| publisher | American Institute of Physics (AIP) |
| reference | 63 (1992), S. 3835-3841 |
| search_space | articles |
| shingle_author_1 | Dennison, J. R. Wang, S.-K. Dai, P. Angot, T. Taub, H. Ehrlich, S. N. |
| shingle_author_2 | Dennison, J. R. Wang, S.-K. Dai, P. Angot, T. Taub, H. Ehrlich, S. N. |
| shingle_author_3 | Dennison, J. R. Wang, S.-K. Dai, P. Angot, T. Taub, H. Ehrlich, S. N. |
| shingle_author_4 | Dennison, J. R. Wang, S.-K. Dai, P. Angot, T. Taub, H. Ehrlich, S. N. |
| shingle_catch_all_1 | Dennison, J. R. Wang, S.-K. Dai, P. Angot, T. Taub, H. Ehrlich, S. N. Ultrahigh vacuum chamber for synchrotron x-ray diffraction from films adsorbed on single-crystal surfaces An ultrahigh vacuum chamber has been developed for structural analysis of adsorbed films and single-crystal surfaces using synchrotron x-ray diffraction. It is particularly well suited for investigations of physisorbed and other weakly bound films. The chamber is small enough to transport and mount directly on a standard four-axis diffractometer and can also be used independently of the x-ray diffractometer. A low-current, pulse-counting, low-energy electron diffraction/Auger spectroscopy system with a position-sensitive detector enables in situ characterization of the film and substrate while the sample is located at the x-ray scattering position. A closed-cycle He refrigerator and electron bombardment heater provide controlled substrate temperatures from 30 to 1300 K. The chamber is also equipped with an ion sputter gun, a quadrupole mass spectrometer, and a gas handling system. Details of the design and operation of the instrument are described. To demonstrate the performance of the instrument, we present some preliminary results of a study of Xe physisorbed on the Ag(111) surface. 1089-7623 10897623 American Institute of Physics (AIP) |
| shingle_catch_all_2 | Dennison, J. R. Wang, S.-K. Dai, P. Angot, T. Taub, H. Ehrlich, S. N. Ultrahigh vacuum chamber for synchrotron x-ray diffraction from films adsorbed on single-crystal surfaces An ultrahigh vacuum chamber has been developed for structural analysis of adsorbed films and single-crystal surfaces using synchrotron x-ray diffraction. It is particularly well suited for investigations of physisorbed and other weakly bound films. The chamber is small enough to transport and mount directly on a standard four-axis diffractometer and can also be used independently of the x-ray diffractometer. A low-current, pulse-counting, low-energy electron diffraction/Auger spectroscopy system with a position-sensitive detector enables in situ characterization of the film and substrate while the sample is located at the x-ray scattering position. A closed-cycle He refrigerator and electron bombardment heater provide controlled substrate temperatures from 30 to 1300 K. The chamber is also equipped with an ion sputter gun, a quadrupole mass spectrometer, and a gas handling system. Details of the design and operation of the instrument are described. To demonstrate the performance of the instrument, we present some preliminary results of a study of Xe physisorbed on the Ag(111) surface. 1089-7623 10897623 American Institute of Physics (AIP) |
| shingle_catch_all_3 | Dennison, J. R. Wang, S.-K. Dai, P. Angot, T. Taub, H. Ehrlich, S. N. Ultrahigh vacuum chamber for synchrotron x-ray diffraction from films adsorbed on single-crystal surfaces An ultrahigh vacuum chamber has been developed for structural analysis of adsorbed films and single-crystal surfaces using synchrotron x-ray diffraction. It is particularly well suited for investigations of physisorbed and other weakly bound films. The chamber is small enough to transport and mount directly on a standard four-axis diffractometer and can also be used independently of the x-ray diffractometer. A low-current, pulse-counting, low-energy electron diffraction/Auger spectroscopy system with a position-sensitive detector enables in situ characterization of the film and substrate while the sample is located at the x-ray scattering position. A closed-cycle He refrigerator and electron bombardment heater provide controlled substrate temperatures from 30 to 1300 K. The chamber is also equipped with an ion sputter gun, a quadrupole mass spectrometer, and a gas handling system. Details of the design and operation of the instrument are described. To demonstrate the performance of the instrument, we present some preliminary results of a study of Xe physisorbed on the Ag(111) surface. 1089-7623 10897623 American Institute of Physics (AIP) |
| shingle_catch_all_4 | Dennison, J. R. Wang, S.-K. Dai, P. Angot, T. Taub, H. Ehrlich, S. N. Ultrahigh vacuum chamber for synchrotron x-ray diffraction from films adsorbed on single-crystal surfaces An ultrahigh vacuum chamber has been developed for structural analysis of adsorbed films and single-crystal surfaces using synchrotron x-ray diffraction. It is particularly well suited for investigations of physisorbed and other weakly bound films. The chamber is small enough to transport and mount directly on a standard four-axis diffractometer and can also be used independently of the x-ray diffractometer. A low-current, pulse-counting, low-energy electron diffraction/Auger spectroscopy system with a position-sensitive detector enables in situ characterization of the film and substrate while the sample is located at the x-ray scattering position. A closed-cycle He refrigerator and electron bombardment heater provide controlled substrate temperatures from 30 to 1300 K. The chamber is also equipped with an ion sputter gun, a quadrupole mass spectrometer, and a gas handling system. Details of the design and operation of the instrument are described. To demonstrate the performance of the instrument, we present some preliminary results of a study of Xe physisorbed on the Ag(111) surface. 1089-7623 10897623 American Institute of Physics (AIP) |
| shingle_title_1 | Ultrahigh vacuum chamber for synchrotron x-ray diffraction from films adsorbed on single-crystal surfaces |
| shingle_title_2 | Ultrahigh vacuum chamber for synchrotron x-ray diffraction from films adsorbed on single-crystal surfaces |
| shingle_title_3 | Ultrahigh vacuum chamber for synchrotron x-ray diffraction from films adsorbed on single-crystal surfaces |
| shingle_title_4 | Ultrahigh vacuum chamber for synchrotron x-ray diffraction from films adsorbed on single-crystal surfaces |
| sigel_instance_filter | dkfz geomar wilbert ipn albert |
| source_archive | AIP Digital Archive |
| timestamp | 2024-05-06T08:05:02.723Z |
| titel | Ultrahigh vacuum chamber for synchrotron x-ray diffraction from films adsorbed on single-crystal surfaces |
| titel_suche | Ultrahigh vacuum chamber for synchrotron x-ray diffraction from films adsorbed on single-crystal surfaces |
| topic | U ZN |
| uid | nat_lic_papers_NLZ219478538 |