Beam-generated plasmas for processing applications : The 42nd annual meeting of the division of plasma physics of the American Physical Society and the 10th international congress on plasma physics

Meger, R. A. ; Blackwell, D. D. ; Fernsler, R. F. ; Lampe, M. ; Leonhardt, D. ; Manheimer, W. M. ; Murphy, D. P. ; Walton, S. G.

[S.l.] : American Institute of Physics (AIP)
Published 2001
ISSN:
1089-7674
Source:
AIP Digital Archive
Topics:
Physics
Notes:
The use of moderate energy electron beams (e-beams) to generate plasma can provide greater control and larger area than existing techniques for processing applications. Kilovolt energy electrons have the ability to efficiently ionize low pressure neutral gas nearly independent of composition. This results in a low-temperature, high-density plasma of nearly controllable composition generated in the beam channel. By confining the electron beam magnetically the plasma generation region can be designated independent of surrounding structures. Particle fluxes to surfaces can then be controlled by the beam and gas parameters, system geometry, and the externally applied rf bias. The Large Area Plasma Processing System (LAPPS) utilizes a 1–5 kV, 2–10 mA/cm2 sheet beam of electrons to generate a 1011–1012 cm−3 density, 1 eV electron temperature plasma. Plasma sheets of up to 60×60 cm2 area have been generated in a variety of molecular and atomic gases using both pulsed and cw e-beam sources. The theoretical basis for the plasma production and decay is presented along with experiments measuring the plasma density, temperature, and potential. Particle fluxes to nearby surfaces are measured along with the effects of radio frequency biasing. The LAPPS source is found to generate large-area plasmas suitable for materials processing. © 2001 American Institute of Physics.
Type of Medium:
Electronic Resource
URL:
_version_ 1798289731289612288
autor Meger, R. A.
Blackwell, D. D.
Fernsler, R. F.
Lampe, M.
Leonhardt, D.
Manheimer, W. M.
Murphy, D. P.
Walton, S. G.
autorsonst Meger, R. A.
Blackwell, D. D.
Fernsler, R. F.
Lampe, M.
Leonhardt, D.
Manheimer, W. M.
Murphy, D. P.
Walton, S. G.
book_url http://dx.doi.org/10.1063/1.1345506
datenlieferant nat_lic_papers
hauptsatz hsatz_simple
identnr NLZ219349533
issn 1089-7674
journal_name Physics of Plasmas
materialart 1
notes The use of moderate energy electron beams (e-beams) to generate plasma can provide greater control and larger area than existing techniques for processing applications. Kilovolt energy electrons have the ability to efficiently ionize low pressure neutral gas nearly independent of composition. This results in a low-temperature, high-density plasma of nearly controllable composition generated in the beam channel. By confining the electron beam magnetically the plasma generation region can be designated independent of surrounding structures. Particle fluxes to surfaces can then be controlled by the beam and gas parameters, system geometry, and the externally applied rf bias. The Large Area Plasma Processing System (LAPPS) utilizes a 1–5 kV, 2–10 mA/cm2 sheet beam of electrons to generate a 1011–1012 cm−3 density, 1 eV electron temperature plasma. Plasma sheets of up to 60×60 cm2 area have been generated in a variety of molecular and atomic gases using both pulsed and cw e-beam sources. The theoretical basis for the plasma production and decay is presented along with experiments measuring the plasma density, temperature, and potential. Particle fluxes to nearby surfaces are measured along with the effects of radio frequency biasing. The LAPPS source is found to generate large-area plasmas suitable for materials processing. © 2001 American Institute of Physics.
package_name American Institute of Physics (AIP)
publikationsjahr_anzeige 2001
publikationsjahr_facette 2001
publikationsjahr_intervall 7999:2000-2004
publikationsjahr_sort 2001
publikationsort [S.l.]
publisher American Institute of Physics (AIP)
reference 8 (2001), S. 2558-2564
search_space articles
shingle_author_1 Meger, R. A.
Blackwell, D. D.
Fernsler, R. F.
Lampe, M.
Leonhardt, D.
Manheimer, W. M.
Murphy, D. P.
Walton, S. G.
shingle_author_2 Meger, R. A.
Blackwell, D. D.
Fernsler, R. F.
Lampe, M.
Leonhardt, D.
Manheimer, W. M.
Murphy, D. P.
Walton, S. G.
shingle_author_3 Meger, R. A.
Blackwell, D. D.
Fernsler, R. F.
Lampe, M.
Leonhardt, D.
Manheimer, W. M.
Murphy, D. P.
Walton, S. G.
shingle_author_4 Meger, R. A.
Blackwell, D. D.
Fernsler, R. F.
Lampe, M.
Leonhardt, D.
Manheimer, W. M.
Murphy, D. P.
Walton, S. G.
shingle_catch_all_1 Meger, R. A.
Blackwell, D. D.
Fernsler, R. F.
Lampe, M.
Leonhardt, D.
Manheimer, W. M.
Murphy, D. P.
Walton, S. G.
Beam-generated plasmas for processing applications : The 42nd annual meeting of the division of plasma physics of the American Physical Society and the 10th international congress on plasma physics
The use of moderate energy electron beams (e-beams) to generate plasma can provide greater control and larger area than existing techniques for processing applications. Kilovolt energy electrons have the ability to efficiently ionize low pressure neutral gas nearly independent of composition. This results in a low-temperature, high-density plasma of nearly controllable composition generated in the beam channel. By confining the electron beam magnetically the plasma generation region can be designated independent of surrounding structures. Particle fluxes to surfaces can then be controlled by the beam and gas parameters, system geometry, and the externally applied rf bias. The Large Area Plasma Processing System (LAPPS) utilizes a 1–5 kV, 2–10 mA/cm2 sheet beam of electrons to generate a 1011–1012 cm−3 density, 1 eV electron temperature plasma. Plasma sheets of up to 60×60 cm2 area have been generated in a variety of molecular and atomic gases using both pulsed and cw e-beam sources. The theoretical basis for the plasma production and decay is presented along with experiments measuring the plasma density, temperature, and potential. Particle fluxes to nearby surfaces are measured along with the effects of radio frequency biasing. The LAPPS source is found to generate large-area plasmas suitable for materials processing. © 2001 American Institute of Physics.
1089-7674
10897674
American Institute of Physics (AIP)
shingle_catch_all_2 Meger, R. A.
Blackwell, D. D.
Fernsler, R. F.
Lampe, M.
Leonhardt, D.
Manheimer, W. M.
Murphy, D. P.
Walton, S. G.
Beam-generated plasmas for processing applications : The 42nd annual meeting of the division of plasma physics of the American Physical Society and the 10th international congress on plasma physics
The use of moderate energy electron beams (e-beams) to generate plasma can provide greater control and larger area than existing techniques for processing applications. Kilovolt energy electrons have the ability to efficiently ionize low pressure neutral gas nearly independent of composition. This results in a low-temperature, high-density plasma of nearly controllable composition generated in the beam channel. By confining the electron beam magnetically the plasma generation region can be designated independent of surrounding structures. Particle fluxes to surfaces can then be controlled by the beam and gas parameters, system geometry, and the externally applied rf bias. The Large Area Plasma Processing System (LAPPS) utilizes a 1–5 kV, 2–10 mA/cm2 sheet beam of electrons to generate a 1011–1012 cm−3 density, 1 eV electron temperature plasma. Plasma sheets of up to 60×60 cm2 area have been generated in a variety of molecular and atomic gases using both pulsed and cw e-beam sources. The theoretical basis for the plasma production and decay is presented along with experiments measuring the plasma density, temperature, and potential. Particle fluxes to nearby surfaces are measured along with the effects of radio frequency biasing. The LAPPS source is found to generate large-area plasmas suitable for materials processing. © 2001 American Institute of Physics.
1089-7674
10897674
American Institute of Physics (AIP)
shingle_catch_all_3 Meger, R. A.
Blackwell, D. D.
Fernsler, R. F.
Lampe, M.
Leonhardt, D.
Manheimer, W. M.
Murphy, D. P.
Walton, S. G.
Beam-generated plasmas for processing applications : The 42nd annual meeting of the division of plasma physics of the American Physical Society and the 10th international congress on plasma physics
The use of moderate energy electron beams (e-beams) to generate plasma can provide greater control and larger area than existing techniques for processing applications. Kilovolt energy electrons have the ability to efficiently ionize low pressure neutral gas nearly independent of composition. This results in a low-temperature, high-density plasma of nearly controllable composition generated in the beam channel. By confining the electron beam magnetically the plasma generation region can be designated independent of surrounding structures. Particle fluxes to surfaces can then be controlled by the beam and gas parameters, system geometry, and the externally applied rf bias. The Large Area Plasma Processing System (LAPPS) utilizes a 1–5 kV, 2–10 mA/cm2 sheet beam of electrons to generate a 1011–1012 cm−3 density, 1 eV electron temperature plasma. Plasma sheets of up to 60×60 cm2 area have been generated in a variety of molecular and atomic gases using both pulsed and cw e-beam sources. The theoretical basis for the plasma production and decay is presented along with experiments measuring the plasma density, temperature, and potential. Particle fluxes to nearby surfaces are measured along with the effects of radio frequency biasing. The LAPPS source is found to generate large-area plasmas suitable for materials processing. © 2001 American Institute of Physics.
1089-7674
10897674
American Institute of Physics (AIP)
shingle_catch_all_4 Meger, R. A.
Blackwell, D. D.
Fernsler, R. F.
Lampe, M.
Leonhardt, D.
Manheimer, W. M.
Murphy, D. P.
Walton, S. G.
Beam-generated plasmas for processing applications : The 42nd annual meeting of the division of plasma physics of the American Physical Society and the 10th international congress on plasma physics
The use of moderate energy electron beams (e-beams) to generate plasma can provide greater control and larger area than existing techniques for processing applications. Kilovolt energy electrons have the ability to efficiently ionize low pressure neutral gas nearly independent of composition. This results in a low-temperature, high-density plasma of nearly controllable composition generated in the beam channel. By confining the electron beam magnetically the plasma generation region can be designated independent of surrounding structures. Particle fluxes to surfaces can then be controlled by the beam and gas parameters, system geometry, and the externally applied rf bias. The Large Area Plasma Processing System (LAPPS) utilizes a 1–5 kV, 2–10 mA/cm2 sheet beam of electrons to generate a 1011–1012 cm−3 density, 1 eV electron temperature plasma. Plasma sheets of up to 60×60 cm2 area have been generated in a variety of molecular and atomic gases using both pulsed and cw e-beam sources. The theoretical basis for the plasma production and decay is presented along with experiments measuring the plasma density, temperature, and potential. Particle fluxes to nearby surfaces are measured along with the effects of radio frequency biasing. The LAPPS source is found to generate large-area plasmas suitable for materials processing. © 2001 American Institute of Physics.
1089-7674
10897674
American Institute of Physics (AIP)
shingle_title_1 Beam-generated plasmas for processing applications : The 42nd annual meeting of the division of plasma physics of the American Physical Society and the 10th international congress on plasma physics
shingle_title_2 Beam-generated plasmas for processing applications : The 42nd annual meeting of the division of plasma physics of the American Physical Society and the 10th international congress on plasma physics
shingle_title_3 Beam-generated plasmas for processing applications : The 42nd annual meeting of the division of plasma physics of the American Physical Society and the 10th international congress on plasma physics
shingle_title_4 Beam-generated plasmas for processing applications : The 42nd annual meeting of the division of plasma physics of the American Physical Society and the 10th international congress on plasma physics
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titel Beam-generated plasmas for processing applications : The 42nd annual meeting of the division of plasma physics of the American Physical Society and the 10th international congress on plasma physics
titel_suche Beam-generated plasmas for processing applications
The 42nd annual meeting of the division of plasma physics of the American Physical Society and the 10th international congress on plasma physics
topic U
uid nat_lic_papers_NLZ219349533