A mechanism of photodissociation of diphenylmethane to a diphenylmethyl radical in solution
Fujiwara, M. ; Yamasaki, A. ; Mishima, K. ; Toyomi, K.
College Park, Md. : American Institute of Physics (AIP)
Published 1998
College Park, Md. : American Institute of Physics (AIP)
Published 1998
| ISSN: |
1089-7690
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|---|---|
| Source: |
AIP Digital Archive
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| Topics: |
Physics
Chemistry and Pharmacology
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| Notes: |
The photodissociation of diphenylmethane by excitation to the S1 state at 266 nm in n-heptane solution is studied by nanosecond fluorescence and absorption spectroscopy. The formation of the diphenylmethyl radical is identified by its fluorescence, which is induced by excitation at 308 nm, and by its absorption. The growth rate of (3.7±0.4)×107 s−1 for the radical is equal to the decay rate of (3.8±0.4)×107 s−1 for the precursor fluorescence. The quantum yield of the radical is of the order of ∼10−3. Neither dissociation to the radical nor intersystem crossing to the T1 state is thermally activated, whereas activated internal conversion to the S0 state is observed. The formation of the radical depends linearly on the photolysis pulse fluence. The data are consistent with a mechanism that the molecule undergoes intersystem crossing from thermally equilibrated levels of the S1 state to vibrationally excited levels of the T1 state at which it dissociates in competition with vibrational relaxation. The mechanism is explained in terms of electronic coupling between the precursor and product states. The S1 state does not correlate adiabatically to the ground state of the C–H bond fission products, so intersystem crossing to the T1 state precedes dissociation. In the T1 state, avoided crossing between the ππ* (benzene) configuration and the σσ* (C–H) repulsive configuration results in the adiabatic potential energy surface which evolves to the ground state of the C–H bond fission products allowing rapid dissociation. © 1998 American Institute of Physics.
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| Type of Medium: |
Electronic Resource
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| URL: |
| _version_ | 1798289770899570690 |
|---|---|
| autor | Fujiwara, M. Yamasaki, A. Mishima, K. Toyomi, K. |
| autorsonst | Fujiwara, M. Yamasaki, A. Mishima, K. Toyomi, K. |
| book_url | http://dx.doi.org/10.1063/1.476688 |
| datenlieferant | nat_lic_papers |
| hauptsatz | hsatz_simple |
| identnr | NLZ219062811 |
| issn | 1089-7690 |
| journal_name | The Journal of Chemical Physics |
| materialart | 1 |
| notes | The photodissociation of diphenylmethane by excitation to the S1 state at 266 nm in n-heptane solution is studied by nanosecond fluorescence and absorption spectroscopy. The formation of the diphenylmethyl radical is identified by its fluorescence, which is induced by excitation at 308 nm, and by its absorption. The growth rate of (3.7±0.4)×107 s−1 for the radical is equal to the decay rate of (3.8±0.4)×107 s−1 for the precursor fluorescence. The quantum yield of the radical is of the order of ∼10−3. Neither dissociation to the radical nor intersystem crossing to the T1 state is thermally activated, whereas activated internal conversion to the S0 state is observed. The formation of the radical depends linearly on the photolysis pulse fluence. The data are consistent with a mechanism that the molecule undergoes intersystem crossing from thermally equilibrated levels of the S1 state to vibrationally excited levels of the T1 state at which it dissociates in competition with vibrational relaxation. The mechanism is explained in terms of electronic coupling between the precursor and product states. The S1 state does not correlate adiabatically to the ground state of the C–H bond fission products, so intersystem crossing to the T1 state precedes dissociation. In the T1 state, avoided crossing between the ππ* (benzene) configuration and the σσ* (C–H) repulsive configuration results in the adiabatic potential energy surface which evolves to the ground state of the C–H bond fission products allowing rapid dissociation. © 1998 American Institute of Physics. |
| package_name | American Institute of Physics (AIP) |
| publikationsjahr_anzeige | 1998 |
| publikationsjahr_facette | 1998 |
| publikationsjahr_intervall | 8004:1995-1999 |
| publikationsjahr_sort | 1998 |
| publikationsort | College Park, Md. |
| publisher | American Institute of Physics (AIP) |
| reference | 109 (1998), S. 1359-1365 |
| search_space | articles |
| shingle_author_1 | Fujiwara, M. Yamasaki, A. Mishima, K. Toyomi, K. |
| shingle_author_2 | Fujiwara, M. Yamasaki, A. Mishima, K. Toyomi, K. |
| shingle_author_3 | Fujiwara, M. Yamasaki, A. Mishima, K. Toyomi, K. |
| shingle_author_4 | Fujiwara, M. Yamasaki, A. Mishima, K. Toyomi, K. |
| shingle_catch_all_1 | Fujiwara, M. Yamasaki, A. Mishima, K. Toyomi, K. A mechanism of photodissociation of diphenylmethane to a diphenylmethyl radical in solution The photodissociation of diphenylmethane by excitation to the S1 state at 266 nm in n-heptane solution is studied by nanosecond fluorescence and absorption spectroscopy. The formation of the diphenylmethyl radical is identified by its fluorescence, which is induced by excitation at 308 nm, and by its absorption. The growth rate of (3.7±0.4)×107 s−1 for the radical is equal to the decay rate of (3.8±0.4)×107 s−1 for the precursor fluorescence. The quantum yield of the radical is of the order of ∼10−3. Neither dissociation to the radical nor intersystem crossing to the T1 state is thermally activated, whereas activated internal conversion to the S0 state is observed. The formation of the radical depends linearly on the photolysis pulse fluence. The data are consistent with a mechanism that the molecule undergoes intersystem crossing from thermally equilibrated levels of the S1 state to vibrationally excited levels of the T1 state at which it dissociates in competition with vibrational relaxation. The mechanism is explained in terms of electronic coupling between the precursor and product states. The S1 state does not correlate adiabatically to the ground state of the C–H bond fission products, so intersystem crossing to the T1 state precedes dissociation. In the T1 state, avoided crossing between the ππ* (benzene) configuration and the σσ* (C–H) repulsive configuration results in the adiabatic potential energy surface which evolves to the ground state of the C–H bond fission products allowing rapid dissociation. © 1998 American Institute of Physics. 1089-7690 10897690 American Institute of Physics (AIP) |
| shingle_catch_all_2 | Fujiwara, M. Yamasaki, A. Mishima, K. Toyomi, K. A mechanism of photodissociation of diphenylmethane to a diphenylmethyl radical in solution The photodissociation of diphenylmethane by excitation to the S1 state at 266 nm in n-heptane solution is studied by nanosecond fluorescence and absorption spectroscopy. The formation of the diphenylmethyl radical is identified by its fluorescence, which is induced by excitation at 308 nm, and by its absorption. The growth rate of (3.7±0.4)×107 s−1 for the radical is equal to the decay rate of (3.8±0.4)×107 s−1 for the precursor fluorescence. The quantum yield of the radical is of the order of ∼10−3. Neither dissociation to the radical nor intersystem crossing to the T1 state is thermally activated, whereas activated internal conversion to the S0 state is observed. The formation of the radical depends linearly on the photolysis pulse fluence. The data are consistent with a mechanism that the molecule undergoes intersystem crossing from thermally equilibrated levels of the S1 state to vibrationally excited levels of the T1 state at which it dissociates in competition with vibrational relaxation. The mechanism is explained in terms of electronic coupling between the precursor and product states. The S1 state does not correlate adiabatically to the ground state of the C–H bond fission products, so intersystem crossing to the T1 state precedes dissociation. In the T1 state, avoided crossing between the ππ* (benzene) configuration and the σσ* (C–H) repulsive configuration results in the adiabatic potential energy surface which evolves to the ground state of the C–H bond fission products allowing rapid dissociation. © 1998 American Institute of Physics. 1089-7690 10897690 American Institute of Physics (AIP) |
| shingle_catch_all_3 | Fujiwara, M. Yamasaki, A. Mishima, K. Toyomi, K. A mechanism of photodissociation of diphenylmethane to a diphenylmethyl radical in solution The photodissociation of diphenylmethane by excitation to the S1 state at 266 nm in n-heptane solution is studied by nanosecond fluorescence and absorption spectroscopy. The formation of the diphenylmethyl radical is identified by its fluorescence, which is induced by excitation at 308 nm, and by its absorption. The growth rate of (3.7±0.4)×107 s−1 for the radical is equal to the decay rate of (3.8±0.4)×107 s−1 for the precursor fluorescence. The quantum yield of the radical is of the order of ∼10−3. Neither dissociation to the radical nor intersystem crossing to the T1 state is thermally activated, whereas activated internal conversion to the S0 state is observed. The formation of the radical depends linearly on the photolysis pulse fluence. The data are consistent with a mechanism that the molecule undergoes intersystem crossing from thermally equilibrated levels of the S1 state to vibrationally excited levels of the T1 state at which it dissociates in competition with vibrational relaxation. The mechanism is explained in terms of electronic coupling between the precursor and product states. The S1 state does not correlate adiabatically to the ground state of the C–H bond fission products, so intersystem crossing to the T1 state precedes dissociation. In the T1 state, avoided crossing between the ππ* (benzene) configuration and the σσ* (C–H) repulsive configuration results in the adiabatic potential energy surface which evolves to the ground state of the C–H bond fission products allowing rapid dissociation. © 1998 American Institute of Physics. 1089-7690 10897690 American Institute of Physics (AIP) |
| shingle_catch_all_4 | Fujiwara, M. Yamasaki, A. Mishima, K. Toyomi, K. A mechanism of photodissociation of diphenylmethane to a diphenylmethyl radical in solution The photodissociation of diphenylmethane by excitation to the S1 state at 266 nm in n-heptane solution is studied by nanosecond fluorescence and absorption spectroscopy. The formation of the diphenylmethyl radical is identified by its fluorescence, which is induced by excitation at 308 nm, and by its absorption. The growth rate of (3.7±0.4)×107 s−1 for the radical is equal to the decay rate of (3.8±0.4)×107 s−1 for the precursor fluorescence. The quantum yield of the radical is of the order of ∼10−3. Neither dissociation to the radical nor intersystem crossing to the T1 state is thermally activated, whereas activated internal conversion to the S0 state is observed. The formation of the radical depends linearly on the photolysis pulse fluence. The data are consistent with a mechanism that the molecule undergoes intersystem crossing from thermally equilibrated levels of the S1 state to vibrationally excited levels of the T1 state at which it dissociates in competition with vibrational relaxation. The mechanism is explained in terms of electronic coupling between the precursor and product states. The S1 state does not correlate adiabatically to the ground state of the C–H bond fission products, so intersystem crossing to the T1 state precedes dissociation. In the T1 state, avoided crossing between the ππ* (benzene) configuration and the σσ* (C–H) repulsive configuration results in the adiabatic potential energy surface which evolves to the ground state of the C–H bond fission products allowing rapid dissociation. © 1998 American Institute of Physics. 1089-7690 10897690 American Institute of Physics (AIP) |
| shingle_title_1 | A mechanism of photodissociation of diphenylmethane to a diphenylmethyl radical in solution |
| shingle_title_2 | A mechanism of photodissociation of diphenylmethane to a diphenylmethyl radical in solution |
| shingle_title_3 | A mechanism of photodissociation of diphenylmethane to a diphenylmethyl radical in solution |
| shingle_title_4 | A mechanism of photodissociation of diphenylmethane to a diphenylmethyl radical in solution |
| sigel_instance_filter | dkfz geomar wilbert ipn albert |
| source_archive | AIP Digital Archive |
| timestamp | 2024-05-06T08:06:07.728Z |
| titel | A mechanism of photodissociation of diphenylmethane to a diphenylmethyl radical in solution |
| titel_suche | A mechanism of photodissociation of diphenylmethane to a diphenylmethyl radical in solution |
| topic | U V |
| uid | nat_lic_papers_NLZ219062811 |