A 193 nm laser photofragmentation time-of-flight mass spectrometric study of CH3SSCH3, SSCH3, and SCH3
Nourbakhsh, S. ; Liao, C.-L. ; Ng, C. Y.
College Park, Md. : American Institute of Physics (AIP)
Published 1990
College Park, Md. : American Institute of Physics (AIP)
Published 1990
| ISSN: |
1089-7690
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|---|---|
| Source: |
AIP Digital Archive
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| Topics: |
Physics
Chemistry and Pharmacology
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| Notes: |
We have measured the time-of-flight (TOF) spectra for SCH3, CH3, and SSCH3 formed in the photodissociation processes, CH3SSCH3+hν(193 nm)→2SCH3 and CH3+SSCH3. The dissociation energies for the CH3S–SCH3 and CH3SS–CH3 bonds determined at 0 K by the TOF measurements are 72.4±1.5 and 55.0±1.5 kcal/mol, in agreement with the literature values. The threshold value for the formation of S2 measured by the TOF spectrum for S2 is in accord with the thermochemical threshold for the process, SSCH3+hν(193 nm) →S2+CH3. The threshold energy determined from the TOF spectrum for S is found to be consistent with the thermochemical threshold for the photodissociation process, SCH3+hν(193 nm) →S(1D)+CH3, an observation supporting that S atoms are not produced in the ground S(3P) state in the 193 nm photodissociation of SCH3. This observation is rationalized by symmetry correlation arguments applied between the S+CH3 product and SCH3 states.
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| Type of Medium: |
Electronic Resource
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| URL: |
| _version_ | 1798289747669417985 |
|---|---|
| autor | Nourbakhsh, S. Liao, C.-L. Ng, C. Y. |
| autorsonst | Nourbakhsh, S. Liao, C.-L. Ng, C. Y. |
| book_url | http://dx.doi.org/10.1063/1.458295 |
| datenlieferant | nat_lic_papers |
| hauptsatz | hsatz_simple |
| identnr | NLZ218871147 |
| issn | 1089-7690 |
| journal_name | The Journal of Chemical Physics |
| materialart | 1 |
| notes | We have measured the time-of-flight (TOF) spectra for SCH3, CH3, and SSCH3 formed in the photodissociation processes, CH3SSCH3+hν(193 nm)→2SCH3 and CH3+SSCH3. The dissociation energies for the CH3S–SCH3 and CH3SS–CH3 bonds determined at 0 K by the TOF measurements are 72.4±1.5 and 55.0±1.5 kcal/mol, in agreement with the literature values. The threshold value for the formation of S2 measured by the TOF spectrum for S2 is in accord with the thermochemical threshold for the process, SSCH3+hν(193 nm) →S2+CH3. The threshold energy determined from the TOF spectrum for S is found to be consistent with the thermochemical threshold for the photodissociation process, SCH3+hν(193 nm) →S(1D)+CH3, an observation supporting that S atoms are not produced in the ground S(3P) state in the 193 nm photodissociation of SCH3. This observation is rationalized by symmetry correlation arguments applied between the S+CH3 product and SCH3 states. |
| package_name | American Institute of Physics (AIP) |
| publikationsjahr_anzeige | 1990 |
| publikationsjahr_facette | 1990 |
| publikationsjahr_intervall | 8009:1990-1994 |
| publikationsjahr_sort | 1990 |
| publikationsort | College Park, Md. |
| publisher | American Institute of Physics (AIP) |
| reference | 92 (1990), S. 6587-6593 |
| search_space | articles |
| shingle_author_1 | Nourbakhsh, S. Liao, C.-L. Ng, C. Y. |
| shingle_author_2 | Nourbakhsh, S. Liao, C.-L. Ng, C. Y. |
| shingle_author_3 | Nourbakhsh, S. Liao, C.-L. Ng, C. Y. |
| shingle_author_4 | Nourbakhsh, S. Liao, C.-L. Ng, C. Y. |
| shingle_catch_all_1 | Nourbakhsh, S. Liao, C.-L. Ng, C. Y. A 193 nm laser photofragmentation time-of-flight mass spectrometric study of CH3SSCH3, SSCH3, and SCH3 We have measured the time-of-flight (TOF) spectra for SCH3, CH3, and SSCH3 formed in the photodissociation processes, CH3SSCH3+hν(193 nm)→2SCH3 and CH3+SSCH3. The dissociation energies for the CH3S–SCH3 and CH3SS–CH3 bonds determined at 0 K by the TOF measurements are 72.4±1.5 and 55.0±1.5 kcal/mol, in agreement with the literature values. The threshold value for the formation of S2 measured by the TOF spectrum for S2 is in accord with the thermochemical threshold for the process, SSCH3+hν(193 nm) →S2+CH3. The threshold energy determined from the TOF spectrum for S is found to be consistent with the thermochemical threshold for the photodissociation process, SCH3+hν(193 nm) →S(1D)+CH3, an observation supporting that S atoms are not produced in the ground S(3P) state in the 193 nm photodissociation of SCH3. This observation is rationalized by symmetry correlation arguments applied between the S+CH3 product and SCH3 states. 1089-7690 10897690 American Institute of Physics (AIP) |
| shingle_catch_all_2 | Nourbakhsh, S. Liao, C.-L. Ng, C. Y. A 193 nm laser photofragmentation time-of-flight mass spectrometric study of CH3SSCH3, SSCH3, and SCH3 We have measured the time-of-flight (TOF) spectra for SCH3, CH3, and SSCH3 formed in the photodissociation processes, CH3SSCH3+hν(193 nm)→2SCH3 and CH3+SSCH3. The dissociation energies for the CH3S–SCH3 and CH3SS–CH3 bonds determined at 0 K by the TOF measurements are 72.4±1.5 and 55.0±1.5 kcal/mol, in agreement with the literature values. The threshold value for the formation of S2 measured by the TOF spectrum for S2 is in accord with the thermochemical threshold for the process, SSCH3+hν(193 nm) →S2+CH3. The threshold energy determined from the TOF spectrum for S is found to be consistent with the thermochemical threshold for the photodissociation process, SCH3+hν(193 nm) →S(1D)+CH3, an observation supporting that S atoms are not produced in the ground S(3P) state in the 193 nm photodissociation of SCH3. This observation is rationalized by symmetry correlation arguments applied between the S+CH3 product and SCH3 states. 1089-7690 10897690 American Institute of Physics (AIP) |
| shingle_catch_all_3 | Nourbakhsh, S. Liao, C.-L. Ng, C. Y. A 193 nm laser photofragmentation time-of-flight mass spectrometric study of CH3SSCH3, SSCH3, and SCH3 We have measured the time-of-flight (TOF) spectra for SCH3, CH3, and SSCH3 formed in the photodissociation processes, CH3SSCH3+hν(193 nm)→2SCH3 and CH3+SSCH3. The dissociation energies for the CH3S–SCH3 and CH3SS–CH3 bonds determined at 0 K by the TOF measurements are 72.4±1.5 and 55.0±1.5 kcal/mol, in agreement with the literature values. The threshold value for the formation of S2 measured by the TOF spectrum for S2 is in accord with the thermochemical threshold for the process, SSCH3+hν(193 nm) →S2+CH3. The threshold energy determined from the TOF spectrum for S is found to be consistent with the thermochemical threshold for the photodissociation process, SCH3+hν(193 nm) →S(1D)+CH3, an observation supporting that S atoms are not produced in the ground S(3P) state in the 193 nm photodissociation of SCH3. This observation is rationalized by symmetry correlation arguments applied between the S+CH3 product and SCH3 states. 1089-7690 10897690 American Institute of Physics (AIP) |
| shingle_catch_all_4 | Nourbakhsh, S. Liao, C.-L. Ng, C. Y. A 193 nm laser photofragmentation time-of-flight mass spectrometric study of CH3SSCH3, SSCH3, and SCH3 We have measured the time-of-flight (TOF) spectra for SCH3, CH3, and SSCH3 formed in the photodissociation processes, CH3SSCH3+hν(193 nm)→2SCH3 and CH3+SSCH3. The dissociation energies for the CH3S–SCH3 and CH3SS–CH3 bonds determined at 0 K by the TOF measurements are 72.4±1.5 and 55.0±1.5 kcal/mol, in agreement with the literature values. The threshold value for the formation of S2 measured by the TOF spectrum for S2 is in accord with the thermochemical threshold for the process, SSCH3+hν(193 nm) →S2+CH3. The threshold energy determined from the TOF spectrum for S is found to be consistent with the thermochemical threshold for the photodissociation process, SCH3+hν(193 nm) →S(1D)+CH3, an observation supporting that S atoms are not produced in the ground S(3P) state in the 193 nm photodissociation of SCH3. This observation is rationalized by symmetry correlation arguments applied between the S+CH3 product and SCH3 states. 1089-7690 10897690 American Institute of Physics (AIP) |
| shingle_title_1 | A 193 nm laser photofragmentation time-of-flight mass spectrometric study of CH3SSCH3, SSCH3, and SCH3 |
| shingle_title_2 | A 193 nm laser photofragmentation time-of-flight mass spectrometric study of CH3SSCH3, SSCH3, and SCH3 |
| shingle_title_3 | A 193 nm laser photofragmentation time-of-flight mass spectrometric study of CH3SSCH3, SSCH3, and SCH3 |
| shingle_title_4 | A 193 nm laser photofragmentation time-of-flight mass spectrometric study of CH3SSCH3, SSCH3, and SCH3 |
| sigel_instance_filter | dkfz geomar wilbert ipn albert |
| source_archive | AIP Digital Archive |
| timestamp | 2024-05-06T08:05:45.145Z |
| titel | A 193 nm laser photofragmentation time-of-flight mass spectrometric study of CH3SSCH3, SSCH3, and SCH3 |
| titel_suche | A 193 nm laser photofragmentation time-of-flight mass spectrometric study of CH3SSCH3, SSCH3, and SCH3 |
| topic | U V |
| uid | nat_lic_papers_NLZ218871147 |