Photochemistry of adsorbed molecules. XII. Photoinduced ion–molecule reactions at a metal surface for CH3X/RCl/Ag(111) (X=Br, I)

Dixon-Warren, St. J. ; Heyd, D. V. ; Jensen, E. T. ; Polanyi, J. C.

College Park, Md. : American Institute of Physics (AIP)
Published 1993
ISSN:
1089-7690
Source:
AIP Digital Archive
Topics:
Physics
Chemistry and Pharmacology
Notes:
A photoinduced ion–molecule reaction is reported between superimposed molecular layers of alkyl halides on a metal substrate CH3X/RCl/Ag(111) (where X=Br or I and R=CCl3, CHCl2, or CH2Cl) to form CH3Cl(ad) (wavelengths 193, 248, and 350 nm). The reaction is mediated by charge-transfer (CT) photodissociation, in which photoelectrons from the metal surface transfer to the lower layer of adsorbate RCl to form RCl−. These negative ions then react with the upper layer CH3X in an ion–molecule reaction to form CH3Cl+X−. The yield of product CH3Cl is found to be enhanced at ∼1 ML of adsorbed CH3X (upper layer) due to a decrease in the local potential in the region of the adsorbate–adsorbate interface that enhances the probability of CT to the lower layer. In addition to lowering the local potential at the interface, the adsorbed CH3X also lowers the surface work function; as a result changes in the microscopic local potential correlate (via the CT reaction rate) with changes in the observed macroscopic work function. The yield of CH3Cl decreases at still higher CH3X coverage in the upper layer as the work function increases. The ion–molecule reaction gives evidence of being a concerted process in which the Cl− reacts as it separates from RCl− rather than following separation. The reagent RCl−, as in the surface reaction discussed in the previous paper, is formed by CT from "hot'' electrons rather than free photoelectrons.
Type of Medium:
Electronic Resource
URL:
_version_ 1798289739009228802
autor Dixon-Warren, St. J.
Heyd, D. V.
Jensen, E. T.
Polanyi, J. C.
autorsonst Dixon-Warren, St. J.
Heyd, D. V.
Jensen, E. T.
Polanyi, J. C.
book_url http://dx.doi.org/10.1063/1.464889
datenlieferant nat_lic_papers
hauptsatz hsatz_simple
identnr NLZ21880170X
issn 1089-7690
journal_name The Journal of Chemical Physics
materialart 1
notes A photoinduced ion–molecule reaction is reported between superimposed molecular layers of alkyl halides on a metal substrate CH3X/RCl/Ag(111) (where X=Br or I and R=CCl3, CHCl2, or CH2Cl) to form CH3Cl(ad) (wavelengths 193, 248, and 350 nm). The reaction is mediated by charge-transfer (CT) photodissociation, in which photoelectrons from the metal surface transfer to the lower layer of adsorbate RCl to form RCl−. These negative ions then react with the upper layer CH3X in an ion–molecule reaction to form CH3Cl+X−. The yield of product CH3Cl is found to be enhanced at ∼1 ML of adsorbed CH3X (upper layer) due to a decrease in the local potential in the region of the adsorbate–adsorbate interface that enhances the probability of CT to the lower layer. In addition to lowering the local potential at the interface, the adsorbed CH3X also lowers the surface work function; as a result changes in the microscopic local potential correlate (via the CT reaction rate) with changes in the observed macroscopic work function. The yield of CH3Cl decreases at still higher CH3X coverage in the upper layer as the work function increases. The ion–molecule reaction gives evidence of being a concerted process in which the Cl− reacts as it separates from RCl− rather than following separation. The reagent RCl−, as in the surface reaction discussed in the previous paper, is formed by CT from "hot'' electrons rather than free photoelectrons.
package_name American Institute of Physics (AIP)
publikationsjahr_anzeige 1993
publikationsjahr_facette 1993
publikationsjahr_intervall 8009:1990-1994
publikationsjahr_sort 1993
publikationsort College Park, Md.
publisher American Institute of Physics (AIP)
reference 98 (1993), S. 5954-5960
search_space articles
shingle_author_1 Dixon-Warren, St. J.
Heyd, D. V.
Jensen, E. T.
Polanyi, J. C.
shingle_author_2 Dixon-Warren, St. J.
Heyd, D. V.
Jensen, E. T.
Polanyi, J. C.
shingle_author_3 Dixon-Warren, St. J.
Heyd, D. V.
Jensen, E. T.
Polanyi, J. C.
shingle_author_4 Dixon-Warren, St. J.
Heyd, D. V.
Jensen, E. T.
Polanyi, J. C.
shingle_catch_all_1 Dixon-Warren, St. J.
Heyd, D. V.
Jensen, E. T.
Polanyi, J. C.
Photochemistry of adsorbed molecules. XII. Photoinduced ion–molecule reactions at a metal surface for CH3X/RCl/Ag(111) (X=Br, I)
A photoinduced ion–molecule reaction is reported between superimposed molecular layers of alkyl halides on a metal substrate CH3X/RCl/Ag(111) (where X=Br or I and R=CCl3, CHCl2, or CH2Cl) to form CH3Cl(ad) (wavelengths 193, 248, and 350 nm). The reaction is mediated by charge-transfer (CT) photodissociation, in which photoelectrons from the metal surface transfer to the lower layer of adsorbate RCl to form RCl−. These negative ions then react with the upper layer CH3X in an ion–molecule reaction to form CH3Cl+X−. The yield of product CH3Cl is found to be enhanced at ∼1 ML of adsorbed CH3X (upper layer) due to a decrease in the local potential in the region of the adsorbate–adsorbate interface that enhances the probability of CT to the lower layer. In addition to lowering the local potential at the interface, the adsorbed CH3X also lowers the surface work function; as a result changes in the microscopic local potential correlate (via the CT reaction rate) with changes in the observed macroscopic work function. The yield of CH3Cl decreases at still higher CH3X coverage in the upper layer as the work function increases. The ion–molecule reaction gives evidence of being a concerted process in which the Cl− reacts as it separates from RCl− rather than following separation. The reagent RCl−, as in the surface reaction discussed in the previous paper, is formed by CT from "hot'' electrons rather than free photoelectrons.
1089-7690
10897690
American Institute of Physics (AIP)
shingle_catch_all_2 Dixon-Warren, St. J.
Heyd, D. V.
Jensen, E. T.
Polanyi, J. C.
Photochemistry of adsorbed molecules. XII. Photoinduced ion–molecule reactions at a metal surface for CH3X/RCl/Ag(111) (X=Br, I)
A photoinduced ion–molecule reaction is reported between superimposed molecular layers of alkyl halides on a metal substrate CH3X/RCl/Ag(111) (where X=Br or I and R=CCl3, CHCl2, or CH2Cl) to form CH3Cl(ad) (wavelengths 193, 248, and 350 nm). The reaction is mediated by charge-transfer (CT) photodissociation, in which photoelectrons from the metal surface transfer to the lower layer of adsorbate RCl to form RCl−. These negative ions then react with the upper layer CH3X in an ion–molecule reaction to form CH3Cl+X−. The yield of product CH3Cl is found to be enhanced at ∼1 ML of adsorbed CH3X (upper layer) due to a decrease in the local potential in the region of the adsorbate–adsorbate interface that enhances the probability of CT to the lower layer. In addition to lowering the local potential at the interface, the adsorbed CH3X also lowers the surface work function; as a result changes in the microscopic local potential correlate (via the CT reaction rate) with changes in the observed macroscopic work function. The yield of CH3Cl decreases at still higher CH3X coverage in the upper layer as the work function increases. The ion–molecule reaction gives evidence of being a concerted process in which the Cl− reacts as it separates from RCl− rather than following separation. The reagent RCl−, as in the surface reaction discussed in the previous paper, is formed by CT from "hot'' electrons rather than free photoelectrons.
1089-7690
10897690
American Institute of Physics (AIP)
shingle_catch_all_3 Dixon-Warren, St. J.
Heyd, D. V.
Jensen, E. T.
Polanyi, J. C.
Photochemistry of adsorbed molecules. XII. Photoinduced ion–molecule reactions at a metal surface for CH3X/RCl/Ag(111) (X=Br, I)
A photoinduced ion–molecule reaction is reported between superimposed molecular layers of alkyl halides on a metal substrate CH3X/RCl/Ag(111) (where X=Br or I and R=CCl3, CHCl2, or CH2Cl) to form CH3Cl(ad) (wavelengths 193, 248, and 350 nm). The reaction is mediated by charge-transfer (CT) photodissociation, in which photoelectrons from the metal surface transfer to the lower layer of adsorbate RCl to form RCl−. These negative ions then react with the upper layer CH3X in an ion–molecule reaction to form CH3Cl+X−. The yield of product CH3Cl is found to be enhanced at ∼1 ML of adsorbed CH3X (upper layer) due to a decrease in the local potential in the region of the adsorbate–adsorbate interface that enhances the probability of CT to the lower layer. In addition to lowering the local potential at the interface, the adsorbed CH3X also lowers the surface work function; as a result changes in the microscopic local potential correlate (via the CT reaction rate) with changes in the observed macroscopic work function. The yield of CH3Cl decreases at still higher CH3X coverage in the upper layer as the work function increases. The ion–molecule reaction gives evidence of being a concerted process in which the Cl− reacts as it separates from RCl− rather than following separation. The reagent RCl−, as in the surface reaction discussed in the previous paper, is formed by CT from "hot'' electrons rather than free photoelectrons.
1089-7690
10897690
American Institute of Physics (AIP)
shingle_catch_all_4 Dixon-Warren, St. J.
Heyd, D. V.
Jensen, E. T.
Polanyi, J. C.
Photochemistry of adsorbed molecules. XII. Photoinduced ion–molecule reactions at a metal surface for CH3X/RCl/Ag(111) (X=Br, I)
A photoinduced ion–molecule reaction is reported between superimposed molecular layers of alkyl halides on a metal substrate CH3X/RCl/Ag(111) (where X=Br or I and R=CCl3, CHCl2, or CH2Cl) to form CH3Cl(ad) (wavelengths 193, 248, and 350 nm). The reaction is mediated by charge-transfer (CT) photodissociation, in which photoelectrons from the metal surface transfer to the lower layer of adsorbate RCl to form RCl−. These negative ions then react with the upper layer CH3X in an ion–molecule reaction to form CH3Cl+X−. The yield of product CH3Cl is found to be enhanced at ∼1 ML of adsorbed CH3X (upper layer) due to a decrease in the local potential in the region of the adsorbate–adsorbate interface that enhances the probability of CT to the lower layer. In addition to lowering the local potential at the interface, the adsorbed CH3X also lowers the surface work function; as a result changes in the microscopic local potential correlate (via the CT reaction rate) with changes in the observed macroscopic work function. The yield of CH3Cl decreases at still higher CH3X coverage in the upper layer as the work function increases. The ion–molecule reaction gives evidence of being a concerted process in which the Cl− reacts as it separates from RCl− rather than following separation. The reagent RCl−, as in the surface reaction discussed in the previous paper, is formed by CT from "hot'' electrons rather than free photoelectrons.
1089-7690
10897690
American Institute of Physics (AIP)
shingle_title_1 Photochemistry of adsorbed molecules. XII. Photoinduced ion–molecule reactions at a metal surface for CH3X/RCl/Ag(111) (X=Br, I)
shingle_title_2 Photochemistry of adsorbed molecules. XII. Photoinduced ion–molecule reactions at a metal surface for CH3X/RCl/Ag(111) (X=Br, I)
shingle_title_3 Photochemistry of adsorbed molecules. XII. Photoinduced ion–molecule reactions at a metal surface for CH3X/RCl/Ag(111) (X=Br, I)
shingle_title_4 Photochemistry of adsorbed molecules. XII. Photoinduced ion–molecule reactions at a metal surface for CH3X/RCl/Ag(111) (X=Br, I)
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timestamp 2024-05-06T08:05:37.352Z
titel Photochemistry of adsorbed molecules. XII. Photoinduced ion–molecule reactions at a metal surface for CH3X/RCl/Ag(111) (X=Br, I)
titel_suche Photochemistry of adsorbed molecules. XII. Photoinduced ion–molecule reactions at a metal surface for CH3X/RCl/Ag(111) (X=Br, I)
topic U
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