APA (7th ed.) Citation

Eshraghi, S. A., Georgiou, G. E., & Liu, R. (1990). The effect of the chemical vapor deposition of tungsten on shallow n+p and p+n junctions using titanium-tungsten as a barrier. American Institute of Physics (AIP).

Chicago Style (17th ed.) Citation

Eshraghi, S. A., G. E. Georgiou, and R. Liu. The Effect of the Chemical Vapor Deposition of Tungsten on Shallow N+p and P+n Junctions Using Titanium-tungsten as a Barrier. [S.l.]: American Institute of Physics (AIP), 1990.

MLA (9th ed.) Citation

Eshraghi, S. A., et al. The Effect of the Chemical Vapor Deposition of Tungsten on Shallow N+p and P+n Junctions Using Titanium-tungsten as a Barrier. American Institute of Physics (AIP), 1990.