Time-resolved reflectivity measurements of temperature distributions during swept-line electron-beam heating of silicon

England, J. M. C. ; Zissis, N. ; Timans, P. J. ; Ahmed, H.

[S.l.] : American Institute of Physics (AIP)
Published 1991
ISSN:
1089-7550
Source:
AIP Digital Archive
Topics:
Physics
Notes:
Experiments have been carried out to determine the temperature distributions induced during swept-line electron-beam heating of silicon. In situ measurements of the reflectivity were used to determine the temperature rise, using as a basis the rise in reflectivity exhibited by silicon with increasing temperature. Sweep speeds between 10 and 60 cm/s were studied using line beams between 60 and 300 μm wide. The experimental results were compared with analytic one- and two-dimensional models assuming constant thermal properties, and with a one-dimensional (1D) numerical model which takes into account the variation of heat capacity and thermal conductivity with temperature. The analytic models were used to show the range of conditions over which the 1D approximation could be applied and to quantify the errors introduced as this approximation breaks down. The experimentally measured peak temperatures and those predicted by the numerical model were found to agree to within 5% for conditions where the heat flow was in the 1D regime. For other conditions, the experimental and numerical results were found to differ, but the size of this discrepancy was consistent with the errors introduced by making the 1D approximation in the numerical model.
Type of Medium:
Electronic Resource
URL:
_version_ 1798289663536922624
autor England, J. M. C.
Zissis, N.
Timans, P. J.
Ahmed, H.
autorsonst England, J. M. C.
Zissis, N.
Timans, P. J.
Ahmed, H.
book_url http://dx.doi.org/10.1063/1.350287
datenlieferant nat_lic_papers
hauptsatz hsatz_simple
identnr NLZ218640870
issn 1089-7550
journal_name Journal of Applied Physics
materialart 1
notes Experiments have been carried out to determine the temperature distributions induced during swept-line electron-beam heating of silicon. In situ measurements of the reflectivity were used to determine the temperature rise, using as a basis the rise in reflectivity exhibited by silicon with increasing temperature. Sweep speeds between 10 and 60 cm/s were studied using line beams between 60 and 300 μm wide. The experimental results were compared with analytic one- and two-dimensional models assuming constant thermal properties, and with a one-dimensional (1D) numerical model which takes into account the variation of heat capacity and thermal conductivity with temperature. The analytic models were used to show the range of conditions over which the 1D approximation could be applied and to quantify the errors introduced as this approximation breaks down. The experimentally measured peak temperatures and those predicted by the numerical model were found to agree to within 5% for conditions where the heat flow was in the 1D regime. For other conditions, the experimental and numerical results were found to differ, but the size of this discrepancy was consistent with the errors introduced by making the 1D approximation in the numerical model.
package_name American Institute of Physics (AIP)
publikationsjahr_anzeige 1991
publikationsjahr_facette 1991
publikationsjahr_intervall 8009:1990-1994
publikationsjahr_sort 1991
publikationsort [S.l.]
publisher American Institute of Physics (AIP)
reference 70 (1991), S. 389-397
search_space articles
shingle_author_1 England, J. M. C.
Zissis, N.
Timans, P. J.
Ahmed, H.
shingle_author_2 England, J. M. C.
Zissis, N.
Timans, P. J.
Ahmed, H.
shingle_author_3 England, J. M. C.
Zissis, N.
Timans, P. J.
Ahmed, H.
shingle_author_4 England, J. M. C.
Zissis, N.
Timans, P. J.
Ahmed, H.
shingle_catch_all_1 England, J. M. C.
Zissis, N.
Timans, P. J.
Ahmed, H.
Time-resolved reflectivity measurements of temperature distributions during swept-line electron-beam heating of silicon
Experiments have been carried out to determine the temperature distributions induced during swept-line electron-beam heating of silicon. In situ measurements of the reflectivity were used to determine the temperature rise, using as a basis the rise in reflectivity exhibited by silicon with increasing temperature. Sweep speeds between 10 and 60 cm/s were studied using line beams between 60 and 300 μm wide. The experimental results were compared with analytic one- and two-dimensional models assuming constant thermal properties, and with a one-dimensional (1D) numerical model which takes into account the variation of heat capacity and thermal conductivity with temperature. The analytic models were used to show the range of conditions over which the 1D approximation could be applied and to quantify the errors introduced as this approximation breaks down. The experimentally measured peak temperatures and those predicted by the numerical model were found to agree to within 5% for conditions where the heat flow was in the 1D regime. For other conditions, the experimental and numerical results were found to differ, but the size of this discrepancy was consistent with the errors introduced by making the 1D approximation in the numerical model.
1089-7550
10897550
American Institute of Physics (AIP)
shingle_catch_all_2 England, J. M. C.
Zissis, N.
Timans, P. J.
Ahmed, H.
Time-resolved reflectivity measurements of temperature distributions during swept-line electron-beam heating of silicon
Experiments have been carried out to determine the temperature distributions induced during swept-line electron-beam heating of silicon. In situ measurements of the reflectivity were used to determine the temperature rise, using as a basis the rise in reflectivity exhibited by silicon with increasing temperature. Sweep speeds between 10 and 60 cm/s were studied using line beams between 60 and 300 μm wide. The experimental results were compared with analytic one- and two-dimensional models assuming constant thermal properties, and with a one-dimensional (1D) numerical model which takes into account the variation of heat capacity and thermal conductivity with temperature. The analytic models were used to show the range of conditions over which the 1D approximation could be applied and to quantify the errors introduced as this approximation breaks down. The experimentally measured peak temperatures and those predicted by the numerical model were found to agree to within 5% for conditions where the heat flow was in the 1D regime. For other conditions, the experimental and numerical results were found to differ, but the size of this discrepancy was consistent with the errors introduced by making the 1D approximation in the numerical model.
1089-7550
10897550
American Institute of Physics (AIP)
shingle_catch_all_3 England, J. M. C.
Zissis, N.
Timans, P. J.
Ahmed, H.
Time-resolved reflectivity measurements of temperature distributions during swept-line electron-beam heating of silicon
Experiments have been carried out to determine the temperature distributions induced during swept-line electron-beam heating of silicon. In situ measurements of the reflectivity were used to determine the temperature rise, using as a basis the rise in reflectivity exhibited by silicon with increasing temperature. Sweep speeds between 10 and 60 cm/s were studied using line beams between 60 and 300 μm wide. The experimental results were compared with analytic one- and two-dimensional models assuming constant thermal properties, and with a one-dimensional (1D) numerical model which takes into account the variation of heat capacity and thermal conductivity with temperature. The analytic models were used to show the range of conditions over which the 1D approximation could be applied and to quantify the errors introduced as this approximation breaks down. The experimentally measured peak temperatures and those predicted by the numerical model were found to agree to within 5% for conditions where the heat flow was in the 1D regime. For other conditions, the experimental and numerical results were found to differ, but the size of this discrepancy was consistent with the errors introduced by making the 1D approximation in the numerical model.
1089-7550
10897550
American Institute of Physics (AIP)
shingle_catch_all_4 England, J. M. C.
Zissis, N.
Timans, P. J.
Ahmed, H.
Time-resolved reflectivity measurements of temperature distributions during swept-line electron-beam heating of silicon
Experiments have been carried out to determine the temperature distributions induced during swept-line electron-beam heating of silicon. In situ measurements of the reflectivity were used to determine the temperature rise, using as a basis the rise in reflectivity exhibited by silicon with increasing temperature. Sweep speeds between 10 and 60 cm/s were studied using line beams between 60 and 300 μm wide. The experimental results were compared with analytic one- and two-dimensional models assuming constant thermal properties, and with a one-dimensional (1D) numerical model which takes into account the variation of heat capacity and thermal conductivity with temperature. The analytic models were used to show the range of conditions over which the 1D approximation could be applied and to quantify the errors introduced as this approximation breaks down. The experimentally measured peak temperatures and those predicted by the numerical model were found to agree to within 5% for conditions where the heat flow was in the 1D regime. For other conditions, the experimental and numerical results were found to differ, but the size of this discrepancy was consistent with the errors introduced by making the 1D approximation in the numerical model.
1089-7550
10897550
American Institute of Physics (AIP)
shingle_title_1 Time-resolved reflectivity measurements of temperature distributions during swept-line electron-beam heating of silicon
shingle_title_2 Time-resolved reflectivity measurements of temperature distributions during swept-line electron-beam heating of silicon
shingle_title_3 Time-resolved reflectivity measurements of temperature distributions during swept-line electron-beam heating of silicon
shingle_title_4 Time-resolved reflectivity measurements of temperature distributions during swept-line electron-beam heating of silicon
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source_archive AIP Digital Archive
timestamp 2024-05-06T08:04:25.148Z
titel Time-resolved reflectivity measurements of temperature distributions during swept-line electron-beam heating of silicon
titel_suche Time-resolved reflectivity measurements of temperature distributions during swept-line electron-beam heating of silicon
topic U
uid nat_lic_papers_NLZ218640870