Monte Carlo model for the deposition of electronic energy in solid argon thin films by keV electrons

Vidal, R. ; Baragiola, R. A. ; Ferrón, J.

[S.l.] : American Institute of Physics (AIP)
Published 1996
ISSN:
1089-7550
Source:
AIP Digital Archive
Topics:
Physics
Notes:
The motion of keV electrons in a film of solid argon and the depth distribution of ionizations and excitations are studied using a Monte Carlo simulation. This method does not only allow for accurate inclusion of individual cross sections but also for easy inclusion of finite size effects. We have analyzed the effect of the substrate on electron trajectories and found an important enhancement of the number of electron–hole pairs and excitons produced near the interface by electrons reflected from heavy substrates. © 1996 American Institute of Physics.
Type of Medium:
Electronic Resource
URL:
_version_ 1798289646294138880
autor Vidal, R.
Baragiola, R. A.
Ferrón, J.
autorsonst Vidal, R.
Baragiola, R. A.
Ferrón, J.
book_url http://dx.doi.org/10.1063/1.363617
datenlieferant nat_lic_papers
hauptsatz hsatz_simple
identnr NLZ218502311
issn 1089-7550
journal_name Journal of Applied Physics
materialart 1
notes The motion of keV electrons in a film of solid argon and the depth distribution of ionizations and excitations are studied using a Monte Carlo simulation. This method does not only allow for accurate inclusion of individual cross sections but also for easy inclusion of finite size effects. We have analyzed the effect of the substrate on electron trajectories and found an important enhancement of the number of electron–hole pairs and excitons produced near the interface by electrons reflected from heavy substrates. © 1996 American Institute of Physics.
package_name American Institute of Physics (AIP)
publikationsjahr_anzeige 1996
publikationsjahr_facette 1996
publikationsjahr_intervall 8004:1995-1999
publikationsjahr_sort 1996
publikationsort [S.l.]
publisher American Institute of Physics (AIP)
reference 80 (1996), S. 5653-5658
search_space articles
shingle_author_1 Vidal, R.
Baragiola, R. A.
Ferrón, J.
shingle_author_2 Vidal, R.
Baragiola, R. A.
Ferrón, J.
shingle_author_3 Vidal, R.
Baragiola, R. A.
Ferrón, J.
shingle_author_4 Vidal, R.
Baragiola, R. A.
Ferrón, J.
shingle_catch_all_1 Vidal, R.
Baragiola, R. A.
Ferrón, J.
Monte Carlo model for the deposition of electronic energy in solid argon thin films by keV electrons
The motion of keV electrons in a film of solid argon and the depth distribution of ionizations and excitations are studied using a Monte Carlo simulation. This method does not only allow for accurate inclusion of individual cross sections but also for easy inclusion of finite size effects. We have analyzed the effect of the substrate on electron trajectories and found an important enhancement of the number of electron–hole pairs and excitons produced near the interface by electrons reflected from heavy substrates. © 1996 American Institute of Physics.
1089-7550
10897550
American Institute of Physics (AIP)
shingle_catch_all_2 Vidal, R.
Baragiola, R. A.
Ferrón, J.
Monte Carlo model for the deposition of electronic energy in solid argon thin films by keV electrons
The motion of keV electrons in a film of solid argon and the depth distribution of ionizations and excitations are studied using a Monte Carlo simulation. This method does not only allow for accurate inclusion of individual cross sections but also for easy inclusion of finite size effects. We have analyzed the effect of the substrate on electron trajectories and found an important enhancement of the number of electron–hole pairs and excitons produced near the interface by electrons reflected from heavy substrates. © 1996 American Institute of Physics.
1089-7550
10897550
American Institute of Physics (AIP)
shingle_catch_all_3 Vidal, R.
Baragiola, R. A.
Ferrón, J.
Monte Carlo model for the deposition of electronic energy in solid argon thin films by keV electrons
The motion of keV electrons in a film of solid argon and the depth distribution of ionizations and excitations are studied using a Monte Carlo simulation. This method does not only allow for accurate inclusion of individual cross sections but also for easy inclusion of finite size effects. We have analyzed the effect of the substrate on electron trajectories and found an important enhancement of the number of electron–hole pairs and excitons produced near the interface by electrons reflected from heavy substrates. © 1996 American Institute of Physics.
1089-7550
10897550
American Institute of Physics (AIP)
shingle_catch_all_4 Vidal, R.
Baragiola, R. A.
Ferrón, J.
Monte Carlo model for the deposition of electronic energy in solid argon thin films by keV electrons
The motion of keV electrons in a film of solid argon and the depth distribution of ionizations and excitations are studied using a Monte Carlo simulation. This method does not only allow for accurate inclusion of individual cross sections but also for easy inclusion of finite size effects. We have analyzed the effect of the substrate on electron trajectories and found an important enhancement of the number of electron–hole pairs and excitons produced near the interface by electrons reflected from heavy substrates. © 1996 American Institute of Physics.
1089-7550
10897550
American Institute of Physics (AIP)
shingle_title_1 Monte Carlo model for the deposition of electronic energy in solid argon thin films by keV electrons
shingle_title_2 Monte Carlo model for the deposition of electronic energy in solid argon thin films by keV electrons
shingle_title_3 Monte Carlo model for the deposition of electronic energy in solid argon thin films by keV electrons
shingle_title_4 Monte Carlo model for the deposition of electronic energy in solid argon thin films by keV electrons
sigel_instance_filter dkfz
geomar
wilbert
ipn
albert
source_archive AIP Digital Archive
timestamp 2024-05-06T08:04:08.914Z
titel Monte Carlo model for the deposition of electronic energy in solid argon thin films by keV electrons
titel_suche Monte Carlo model for the deposition of electronic energy in solid argon thin films by keV electrons
topic U
uid nat_lic_papers_NLZ218502311