Pulsed laser deposition of iron oxide films

1089-7550

AIP Digital Archive

Physics

Iron oxide films have been grown onto MgO and oxidized silicon substrates using pulsed laser deposition with a KrF laser. Films deposited in vacuum consisted of the stoichiometric ferrimagnetic γ-Fe2O3 phase, with a saturation magnetization of 371±27 kA/m. However, films deposited in an O2 atmosphere were iron deficient and consisted of the antiferromagnetic α-Fe2O3 phase, with a saturation magnetization of 40±10 kA/m. Films predominantly consisting of the metastable γ-Fe2O3 phase at least 680 nm in thickness could be grown on MgO (001) substrates, which is thicker than films reported elsewhere. The effects of stoichiometry, thickness, and annealing on the magnetic properties of the films are discussed. © 2002 American Institute of Physics.

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