Thermally stimulated resonant current in AlGaAs/GaAs triple barrier diodes

Nakagawa, T. ; Fujita, T. ; Matsumoto, Y. ; Kojima, T. ; Ohta, K.

Woodbury, NY : American Institute of Physics (AIP)
Published 1987
ISSN:
1077-3118
Source:
AIP Digital Archive
Topics:
Physics
Notes:
Thermally stimulated resonant current peaks are observed in Al0.4Ga0.6As/GaAs triple barrier diodes. These current peaks are interpreted as resonant tunnelings from the first excited electron subband in the first well to the first excited subband and to the second excited subband in the second well. The activation energies for these resonance peaks are measured. The results imply that in the substrate-side well there is a large amount of excess electrons to compensate the positive charge of silicon atoms segregated into the structure during the growth.
Type of Medium:
Electronic Resource
URL:
_version_ 1798289635966713856
autor Nakagawa, T.
Fujita, T.
Matsumoto, Y.
Kojima, T.
Ohta, K.
autorsonst Nakagawa, T.
Fujita, T.
Matsumoto, Y.
Kojima, T.
Ohta, K.
book_url http://dx.doi.org/10.1063/1.98417
datenlieferant nat_lic_papers
hauptsatz hsatz_simple
identnr NLZ218331517
iqvoc_descriptor_title iqvoc_00000633:diodes
issn 1077-3118
journal_name Applied Physics Letters
materialart 1
notes Thermally stimulated resonant current peaks are observed in Al0.4Ga0.6As/GaAs triple barrier diodes. These current peaks are interpreted as resonant tunnelings from the first excited electron subband in the first well to the first excited subband and to the second excited subband in the second well. The activation energies for these resonance peaks are measured. The results imply that in the substrate-side well there is a large amount of excess electrons to compensate the positive charge of silicon atoms segregated into the structure during the growth.
package_name American Institute of Physics (AIP)
publikationsjahr_anzeige 1987
publikationsjahr_facette 1987
publikationsjahr_intervall 8014:1985-1989
publikationsjahr_sort 1987
publikationsort Woodbury, NY
publisher American Institute of Physics (AIP)
reference 51 (1987), S. 445-447
search_space articles
shingle_author_1 Nakagawa, T.
Fujita, T.
Matsumoto, Y.
Kojima, T.
Ohta, K.
shingle_author_2 Nakagawa, T.
Fujita, T.
Matsumoto, Y.
Kojima, T.
Ohta, K.
shingle_author_3 Nakagawa, T.
Fujita, T.
Matsumoto, Y.
Kojima, T.
Ohta, K.
shingle_author_4 Nakagawa, T.
Fujita, T.
Matsumoto, Y.
Kojima, T.
Ohta, K.
shingle_catch_all_1 Nakagawa, T.
Fujita, T.
Matsumoto, Y.
Kojima, T.
Ohta, K.
Thermally stimulated resonant current in AlGaAs/GaAs triple barrier diodes
Thermally stimulated resonant current peaks are observed in Al0.4Ga0.6As/GaAs triple barrier diodes. These current peaks are interpreted as resonant tunnelings from the first excited electron subband in the first well to the first excited subband and to the second excited subband in the second well. The activation energies for these resonance peaks are measured. The results imply that in the substrate-side well there is a large amount of excess electrons to compensate the positive charge of silicon atoms segregated into the structure during the growth.
1077-3118
10773118
American Institute of Physics (AIP)
shingle_catch_all_2 Nakagawa, T.
Fujita, T.
Matsumoto, Y.
Kojima, T.
Ohta, K.
Thermally stimulated resonant current in AlGaAs/GaAs triple barrier diodes
Thermally stimulated resonant current peaks are observed in Al0.4Ga0.6As/GaAs triple barrier diodes. These current peaks are interpreted as resonant tunnelings from the first excited electron subband in the first well to the first excited subband and to the second excited subband in the second well. The activation energies for these resonance peaks are measured. The results imply that in the substrate-side well there is a large amount of excess electrons to compensate the positive charge of silicon atoms segregated into the structure during the growth.
1077-3118
10773118
American Institute of Physics (AIP)
shingle_catch_all_3 Nakagawa, T.
Fujita, T.
Matsumoto, Y.
Kojima, T.
Ohta, K.
Thermally stimulated resonant current in AlGaAs/GaAs triple barrier diodes
Thermally stimulated resonant current peaks are observed in Al0.4Ga0.6As/GaAs triple barrier diodes. These current peaks are interpreted as resonant tunnelings from the first excited electron subband in the first well to the first excited subband and to the second excited subband in the second well. The activation energies for these resonance peaks are measured. The results imply that in the substrate-side well there is a large amount of excess electrons to compensate the positive charge of silicon atoms segregated into the structure during the growth.
1077-3118
10773118
American Institute of Physics (AIP)
shingle_catch_all_4 Nakagawa, T.
Fujita, T.
Matsumoto, Y.
Kojima, T.
Ohta, K.
Thermally stimulated resonant current in AlGaAs/GaAs triple barrier diodes
Thermally stimulated resonant current peaks are observed in Al0.4Ga0.6As/GaAs triple barrier diodes. These current peaks are interpreted as resonant tunnelings from the first excited electron subband in the first well to the first excited subband and to the second excited subband in the second well. The activation energies for these resonance peaks are measured. The results imply that in the substrate-side well there is a large amount of excess electrons to compensate the positive charge of silicon atoms segregated into the structure during the growth.
1077-3118
10773118
American Institute of Physics (AIP)
shingle_title_1 Thermally stimulated resonant current in AlGaAs/GaAs triple barrier diodes
shingle_title_2 Thermally stimulated resonant current in AlGaAs/GaAs triple barrier diodes
shingle_title_3 Thermally stimulated resonant current in AlGaAs/GaAs triple barrier diodes
shingle_title_4 Thermally stimulated resonant current in AlGaAs/GaAs triple barrier diodes
sigel_instance_filter dkfz
geomar
wilbert
ipn
albert
source_archive AIP Digital Archive
timestamp 2024-05-06T08:03:59.015Z
titel Thermally stimulated resonant current in AlGaAs/GaAs triple barrier diodes
titel_suche Thermally stimulated resonant current in AlGaAs/GaAs triple barrier diodes
topic U
uid nat_lic_papers_NLZ218331517