High-power GaAs/AlGaAs diode lasers grown on a Si substrate by metalorganic chemical vapor deposition

Connolly, J. ; Dinkel, N. ; Menna, R. ; Gilbert, D. ; Harvey, M.

Woodbury, NY : American Institute of Physics (AIP)
Published 1988
ISSN:
1077-3118
Source:
AIP Digital Archive
Topics:
Physics
Notes:
High-power GaAs/AlGaAs double-heterostructure lasers have been fabricated on Si substrates using a single-step metalorganic chemical vapor deposition process. An output power of 130 mW (per facet) and a slope efficiency of 38% have been obtained under pulsed operation. The peak emission wavelength of the laser was 8823 A(ring) and the beam full width at half power for the parallel and perpendicular far-field radiation patterns were 6° and 41°, respectively.
Type of Medium:
Electronic Resource
URL: