Spectroscopic investigation of oxide states responsible for hot-carrier degradation
Weber, W. ; Brox, M. ; Hofmann, F. ; Huber, H. ; Jäger, D. ; Rieger, D.
Woodbury, NY : American Institute of Physics (AIP)
Published 1989
Woodbury, NY : American Institute of Physics (AIP)
Published 1989
| ISSN: |
1077-3118
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|---|---|
| Source: |
AIP Digital Archive
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| Topics: |
Physics
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| Notes: |
Hole-trap states in the gate oxide of a Si metal-oxide-semiconductor field-effect transistor (MOSFET) are investigated by inhomogeneous excimer laser irradiation. Subbandgap ultraviolet light photons with an energy exceeding a threshold lying between 5.5 and 6.4 eV were found to excite electrons from these originally neutral states into the SiO2 conduction band. A fixed positive charge is left behind. The degradation in MOSFET performance due to the irradiation is comparable to that accompanying hot-hole injection. Also, subsequent hot-electron stress changes the device characteristics in a way similar to hot-electron stress following hot-hole stress. It is concluded that the traps responsible for hot-carrier degradation cause the optically induced charge trapping.
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| Type of Medium: |
Electronic Resource
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| URL: |