Epitaxial growth of superconducting YBa2Cu3O7−x thin films by reactive magnetron sputtering

1077-3118

AIP Digital Archive

Physics

Perfect epitaxial growth of superconducting YBa2Cu3O7−x thin films have been achieved on (100) SrTiO3, (110) SrTiO3, and (100) ZrO2 substrates using a modified planar dc magnetron sputtering system. The films exhibit zero resistances at 87–90 K with transition widths of about 2 K. The critical current density of 1.4×106 A/cm2 at 77 K so far has been measured on the (100) SrTiO3 substrate. The epitaxial orientation of the thin films was influenced by the substrate orientation, the substrate temperature, and the oxygen partial pressure. The quality of growth and the epitaxial orientation of the films were examined by electron channeling, x-ray diffraction, and reflection high-energy electron diffraction techniques. The preferential epitaxial orientation is discussed.

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