Unintentional indium incorporation in GaAs grown by molecular beam epitaxy

Myers, D. R. ; Dawson, L. R. ; Klem, J. F. ; Brennan, T. M. ; Hammons, B. E. ; Simons, D. S. ; Comas, J. ; Pellegrino, J.

Woodbury, NY : American Institute of Physics (AIP)
Published 1990
ISSN:
1077-3118
Source:
AIP Digital Archive
Topics:
Physics
Notes:
We have quantified unintentional indium incorporation in GaAs grown by molecular beam epitaxy in a variety of commercial systems. We find that the unintentional indium density in the epitaxial GaAs is more a function of mounting technique and prior machine history than of the manufacturer's design. The indium densities detected in the epitaxial GaAs for substrates that only partially obscure an indium-bearing mount are equal to levels reported to result in minimum defect densities and narrowest photoluminescence linewidths in In-doped GaAs.
Type of Medium:
Electronic Resource
URL: