Laser-assisted liquid film etching
Lim, P. ; Brock, J. ; Trachtenberg, I.
Woodbury, NY : American Institute of Physics (AIP)
Published 1993
Woodbury, NY : American Institute of Physics (AIP)
Published 1993
| ISSN: |
1077-3118
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|---|---|
| Source: |
AIP Digital Archive
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| Topics: |
Physics
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| Notes: |
Laser-assisted liquid film etching (LALFE) is a new technique for maskless patterning of silicon substrates. This technique involves forming a thin liquid film of etchant on a silicon substrate and focusing a laser beam on the portion to be etched. Results are given for direct-writing, orientation dependent LALFE on (100) and (111)n-Si using films of polyvinyl alcohol (PVA) as a wetting agent for hydrofluoric acid on n-Si.
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| Type of Medium: |
Electronic Resource
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| URL: |