Imaging the irradiance distribution in the optical near field
Aizenberg, J. ; Rogers, J. A. ; Paul, K. E. ; Whitesides, G. M.
Woodbury, NY : American Institute of Physics (AIP)
Published 1997
Woodbury, NY : American Institute of Physics (AIP)
Published 1997
| ISSN: |
1077-3118
|
|---|---|
| Source: |
AIP Digital Archive
|
| Topics: |
Physics
|
| Notes: |
This letter describes the use of a sensitive photoresist for direct imaging of optical intensity profiles in near-field photolithographic experiments. A comparison between experimental patterns in exposed, developed photoresist and calculated profiles of intensity shows that this procedure provides a reliable semiquantitative image of the irradiance distribution in the near field; experiment and theory correlate adequately. A potential use of the superficial diffraction contrast recorded in photoresist as the basis for a new method of the fabrication of nanostructures is discussed. © 1997 American Institute of Physics.
|
| Type of Medium: |
Electronic Resource
|
| URL: |