Strain effects in lattice-mismatched InxGa1−xAs/InyAl1−yAs coupled double quantum wells

Kim, T. W. ; Jung, M. ; Lee, D. U.

Woodbury, NY : American Institute of Physics (AIP)
Published 1998
ISSN:
1077-3118
Source:
AIP Digital Archive
Topics:
Physics
Notes:
Transmission electron microscopy (TEM) and Raman scattering spectroscopy measurements were performed to investigate strain effects in lattice-mismatched InxGa1−xAs/InyAl1−yAs modulation-doped coupled double quantum wells. The high-resolution TEM images showed that a 100-Å In0.8Ga0.2As deep quantum well and a 100-Å In0.53Ga0.47As shallow quantum well were separated by a 30-Å In0.25Ga0.75As embedded potential barrier. The selected-area electron-diffraction pattern obtained from TEM measurements on the InxGa1−xAs/InyAl1−yAs double quantum well showed that the InxGa1−xAs active layers were grown pseudomorphologically on the InP buffer layer. The values of the strain and the stress of the InxGa1−xAs layers were determined from the electron-diffraction pattern. Based on the TEM results, a possible crystal structure for the InxGa1−xAs/InyAl1−yAs coupled double quantum well is presented. © 1998 American Institute of Physics.
Type of Medium:
Electronic Resource
URL: