Quantized tunneling current in the metallic nanogaps formed by electrodeposition and etching

Li, C. Z. ; He, H. X. ; Tao, N. J.

Woodbury, NY : American Institute of Physics (AIP)
Published 2000
ISSN:
1077-3118
Source:
AIP Digital Archive
Topics:
Physics
Notes:
We have studied electron tunneling across the gap between two electrodes as the gap is varied by electrodeposition and etching. The tunneling current tends to change in a stepwise fashion, corresponding to a discrete change of the gap width. The stepwise change is due to the discrete nature of atoms and a series of structural relaxations of the atoms at the electrodes between stable configurations upon deposition and etching. By stabilizing the tunneling current on various steps using a feedback loop, we have demonstrated that stable molecular-scale gaps can be fabricated with subangstrom precision. © 2000 American Institute of Physics.
Type of Medium:
Electronic Resource
URL: