Hall coefficient in vacuum-deposited copper films
ISSN: |
0040-6090
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Source: |
Elsevier Journal Backfiles on ScienceDirect 1907 - 2002
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Topics: |
Physics
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Type of Medium: |
Electronic Resource
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URL: |
_version_ | 1798291428384702465 |
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autor | Kinbara, A. Ueki, K. |
autorsonst | Kinbara, A. Ueki, K. |
book_url | http://linkinghub.elsevier.com/retrieve/pii/0040-6090(72)90394-X |
datenlieferant | nat_lic_papers |
fussnote | The dependence of the Hall coefficient R"H of vacuum-deposited copper films of thickness, temperature and time was investigated by in situ observation. R"H values were found to be larger than the bulk value and a thickness dependence could hardly be observed down to 100 Å. The temperature dependence was appreciably larger than for bulk material, indicating the existence of the size effect predicted by Sondheimer. R"H for very thin films (below 100 Å) left in the vacuum system at 295^oK changed with time, and the change was ascribed to the annihilation of lattice defects in the films. |
hauptsatz | hsatz_simple |
identnr | NLZ178989029 |
issn | 0040-6090 |
journal_name | Thin Solid Films |
materialart | 1 |
package_name | Elsevier |
publikationsort | Amsterdam |
publisher | Elsevier |
reference | 12 (1972), S. 63-66 |
search_space | articles |
shingle_author_1 | Kinbara, A. Ueki, K. |
shingle_author_2 | Kinbara, A. Ueki, K. |
shingle_author_3 | Kinbara, A. Ueki, K. |
shingle_author_4 | Kinbara, A. Ueki, K. |
shingle_catch_all_1 | Kinbara, A. Ueki, K. Hall coefficient in vacuum-deposited copper films 0040-6090 00406090 Elsevier |
shingle_catch_all_2 | Kinbara, A. Ueki, K. Hall coefficient in vacuum-deposited copper films 0040-6090 00406090 Elsevier |
shingle_catch_all_3 | Kinbara, A. Ueki, K. Hall coefficient in vacuum-deposited copper films 0040-6090 00406090 Elsevier |
shingle_catch_all_4 | Kinbara, A. Ueki, K. Hall coefficient in vacuum-deposited copper films 0040-6090 00406090 Elsevier |
shingle_title_1 | Hall coefficient in vacuum-deposited copper films |
shingle_title_2 | Hall coefficient in vacuum-deposited copper films |
shingle_title_3 | Hall coefficient in vacuum-deposited copper films |
shingle_title_4 | Hall coefficient in vacuum-deposited copper films |
sigel_instance_filter | dkfz geomar wilbert ipn albert fhp |
source_archive | Elsevier Journal Backfiles on ScienceDirect 1907 - 2002 |
timestamp | 2024-05-06T08:32:28.631Z |
titel | Hall coefficient in vacuum-deposited copper films |
titel_suche | Hall coefficient in vacuum-deposited copper films The dependence of the Hall coefficient R"H of vacuum-deposited copper films of thickness, temperature and time was investigated by in situ observation. R"H values were found to be larger than the bulk value and a thickness dependence could hardly be observed down to 100 Å. The temperature dependence was appreciably larger than for bulk material, indicating the existence of the size effect predicted by Sondheimer. R"H for very thin films (below 100 Å) left in the vacuum system at 295^oK changed with time, and the change was ascribed to the annihilation of lattice defects in the films. |
topic | U |
uid | nat_lic_papers_NLZ178989029 |