Hall coefficient in vacuum-deposited copper films

Kinbara, A. ; Ueki, K.

Amsterdam : Elsevier
ISSN:
0040-6090
Source:
Elsevier Journal Backfiles on ScienceDirect 1907 - 2002
Topics:
Physics
Type of Medium:
Electronic Resource
URL:
_version_ 1798291428384702465
autor Kinbara, A.
Ueki, K.
autorsonst Kinbara, A.
Ueki, K.
book_url http://linkinghub.elsevier.com/retrieve/pii/0040-6090(72)90394-X
datenlieferant nat_lic_papers
fussnote The dependence of the Hall coefficient R"H of vacuum-deposited copper films of thickness, temperature and time was investigated by in situ observation. R"H values were found to be larger than the bulk value and a thickness dependence could hardly be observed down to 100 Å. The temperature dependence was appreciably larger than for bulk material, indicating the existence of the size effect predicted by Sondheimer. R"H for very thin films (below 100 Å) left in the vacuum system at 295^oK changed with time, and the change was ascribed to the annihilation of lattice defects in the films.
hauptsatz hsatz_simple
identnr NLZ178989029
issn 0040-6090
journal_name Thin Solid Films
materialart 1
package_name Elsevier
publikationsort Amsterdam
publisher Elsevier
reference 12 (1972), S. 63-66
search_space articles
shingle_author_1 Kinbara, A.
Ueki, K.
shingle_author_2 Kinbara, A.
Ueki, K.
shingle_author_3 Kinbara, A.
Ueki, K.
shingle_author_4 Kinbara, A.
Ueki, K.
shingle_catch_all_1 Kinbara, A.
Ueki, K.
Hall coefficient in vacuum-deposited copper films
0040-6090
00406090
Elsevier
shingle_catch_all_2 Kinbara, A.
Ueki, K.
Hall coefficient in vacuum-deposited copper films
0040-6090
00406090
Elsevier
shingle_catch_all_3 Kinbara, A.
Ueki, K.
Hall coefficient in vacuum-deposited copper films
0040-6090
00406090
Elsevier
shingle_catch_all_4 Kinbara, A.
Ueki, K.
Hall coefficient in vacuum-deposited copper films
0040-6090
00406090
Elsevier
shingle_title_1 Hall coefficient in vacuum-deposited copper films
shingle_title_2 Hall coefficient in vacuum-deposited copper films
shingle_title_3 Hall coefficient in vacuum-deposited copper films
shingle_title_4 Hall coefficient in vacuum-deposited copper films
sigel_instance_filter dkfz
geomar
wilbert
ipn
albert
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source_archive Elsevier Journal Backfiles on ScienceDirect 1907 - 2002
timestamp 2024-05-06T08:32:28.631Z
titel Hall coefficient in vacuum-deposited copper films
titel_suche Hall coefficient in vacuum-deposited copper films
The dependence of the Hall coefficient R"H of vacuum-deposited copper films of thickness, temperature and time was investigated by in situ observation. R"H values were found to be larger than the bulk value and a thickness dependence could hardly be observed down to 100 Å. The temperature dependence was appreciably larger than for bulk material, indicating the existence of the size effect predicted by Sondheimer. R"H for very thin films (below 100 Å) left in the vacuum system at 295^oK changed with time, and the change was ascribed to the annihilation of lattice defects in the films.
topic U
uid nat_lic_papers_NLZ178989029