Characterization of a self-aligned RTP titanium disilicide MOS process: titanium-silicon dioxide interaction

Kaplan, W. ; Zhang, S.-L. ; Norstrom, H. ; Ostling, M. ; Lindberg, A.

Amsterdam : Elsevier

ISSN:	0169-4332
Source:	Elsevier Journal Backfiles on ScienceDirect 1907 - 2002
Topics:	Physics
Type of Medium:	Electronic Resource
URL:	http://linkinghub.elsevier.com/retrieve/pii/0169-4332(91)90283-P