Photoacid catalyzed main chain scission of poly(butene-1 sulfone) as a deep UV positive resist
| ISSN: |
0167-9317
|
|---|---|
| Keywords: |
Poly(butene-1 sulfone) ; positive resist ; triphenylsulfonium hexafluoroarsenate
|
| Source: |
Elsevier Journal Backfiles on ScienceDirect 1907 - 2002
|
| Topics: |
Electrical Engineering, Measurement and Control Technology
|
| Type of Medium: |
Electronic Resource
|
| URL: |