Effect of internal oxidation pretreatments and Si contamination on oxide-scale growth and spalling

Hou, P. Y. ; Stringer, J.
Springer
Published 1990
ISSN:
1573-4889
Keywords:
silicon ; internal oxidation ; Cr2O3, reactive-element effect
Source:
Springer Online Journal Archives 1860-2000
Topics:
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
Notes:
Abstract Internal oxidation pretreatments carried out in quartz capsule with a Rhines pack were found to have a profound effect on the subsequent oxidation behavior of alloys. Specimens of Co-15 wt.% Cr, Co-25 wt.% Cr, Ni-25 wt.% Cr, and Ni-25 wt.% Cr-1 wt.% Al were tested at 1100°C after pre-oxidation treatments. Even without the development of internal oxide particles, pretreated binary CoCr and NiCr alloys oxidized with significantly lower rates. Selective oxidation of chromium was observed on the non-Cr2O3-forming Co-base alloys, whereas on the Cr2O3-forming Ni-base alloys, elimination of base-metal oxide, reduction in the Cr2O3 growth rate, and better scale adhesion were found. These effects were more apparent with pre-oxidation temperatures greater than 1000°C and with longer pretreatment times. Contaimination of Si from the quartz is believed to be the cause.
Type of Medium:
Electronic Resource
URL:
_version_ 1798296764090941440
autor Hou, P. Y.
Stringer, J.
autorsonst Hou, P. Y.
Stringer, J.
book_url http://dx.doi.org/10.1007/BF00666805
datenlieferant nat_lic_papers
hauptsatz hsatz_simple
identnr NLM198301227
issn 1573-4889
journal_name Oxidation of metals
materialart 1
notes Abstract Internal oxidation pretreatments carried out in quartz capsule with a Rhines pack were found to have a profound effect on the subsequent oxidation behavior of alloys. Specimens of Co-15 wt.% Cr, Co-25 wt.% Cr, Ni-25 wt.% Cr, and Ni-25 wt.% Cr-1 wt.% Al were tested at 1100°C after pre-oxidation treatments. Even without the development of internal oxide particles, pretreated binary CoCr and NiCr alloys oxidized with significantly lower rates. Selective oxidation of chromium was observed on the non-Cr2O3-forming Co-base alloys, whereas on the Cr2O3-forming Ni-base alloys, elimination of base-metal oxide, reduction in the Cr2O3 growth rate, and better scale adhesion were found. These effects were more apparent with pre-oxidation temperatures greater than 1000°C and with longer pretreatment times. Contaimination of Si from the quartz is believed to be the cause.
package_name Springer
publikationsjahr_anzeige 1990
publikationsjahr_facette 1990
publikationsjahr_intervall 8009:1990-1994
publikationsjahr_sort 1990
publisher Springer
reference 33 (1990), S. 357-369
schlagwort silicon
internal oxidation
Cr2O3, reactive-element effect
search_space articles
shingle_author_1 Hou, P. Y.
Stringer, J.
shingle_author_2 Hou, P. Y.
Stringer, J.
shingle_author_3 Hou, P. Y.
Stringer, J.
shingle_author_4 Hou, P. Y.
Stringer, J.
shingle_catch_all_1 Hou, P. Y.
Stringer, J.
Effect of internal oxidation pretreatments and Si contamination on oxide-scale growth and spalling
silicon
internal oxidation
Cr2O3, reactive-element effect
silicon
internal oxidation
Cr2O3, reactive-element effect
Abstract Internal oxidation pretreatments carried out in quartz capsule with a Rhines pack were found to have a profound effect on the subsequent oxidation behavior of alloys. Specimens of Co-15 wt.% Cr, Co-25 wt.% Cr, Ni-25 wt.% Cr, and Ni-25 wt.% Cr-1 wt.% Al were tested at 1100°C after pre-oxidation treatments. Even without the development of internal oxide particles, pretreated binary CoCr and NiCr alloys oxidized with significantly lower rates. Selective oxidation of chromium was observed on the non-Cr2O3-forming Co-base alloys, whereas on the Cr2O3-forming Ni-base alloys, elimination of base-metal oxide, reduction in the Cr2O3 growth rate, and better scale adhesion were found. These effects were more apparent with pre-oxidation temperatures greater than 1000°C and with longer pretreatment times. Contaimination of Si from the quartz is believed to be the cause.
1573-4889
15734889
Springer
shingle_catch_all_2 Hou, P. Y.
Stringer, J.
Effect of internal oxidation pretreatments and Si contamination on oxide-scale growth and spalling
silicon
internal oxidation
Cr2O3, reactive-element effect
silicon
internal oxidation
Cr2O3, reactive-element effect
Abstract Internal oxidation pretreatments carried out in quartz capsule with a Rhines pack were found to have a profound effect on the subsequent oxidation behavior of alloys. Specimens of Co-15 wt.% Cr, Co-25 wt.% Cr, Ni-25 wt.% Cr, and Ni-25 wt.% Cr-1 wt.% Al were tested at 1100°C after pre-oxidation treatments. Even without the development of internal oxide particles, pretreated binary CoCr and NiCr alloys oxidized with significantly lower rates. Selective oxidation of chromium was observed on the non-Cr2O3-forming Co-base alloys, whereas on the Cr2O3-forming Ni-base alloys, elimination of base-metal oxide, reduction in the Cr2O3 growth rate, and better scale adhesion were found. These effects were more apparent with pre-oxidation temperatures greater than 1000°C and with longer pretreatment times. Contaimination of Si from the quartz is believed to be the cause.
1573-4889
15734889
Springer
shingle_catch_all_3 Hou, P. Y.
Stringer, J.
Effect of internal oxidation pretreatments and Si contamination on oxide-scale growth and spalling
silicon
internal oxidation
Cr2O3, reactive-element effect
silicon
internal oxidation
Cr2O3, reactive-element effect
Abstract Internal oxidation pretreatments carried out in quartz capsule with a Rhines pack were found to have a profound effect on the subsequent oxidation behavior of alloys. Specimens of Co-15 wt.% Cr, Co-25 wt.% Cr, Ni-25 wt.% Cr, and Ni-25 wt.% Cr-1 wt.% Al were tested at 1100°C after pre-oxidation treatments. Even without the development of internal oxide particles, pretreated binary CoCr and NiCr alloys oxidized with significantly lower rates. Selective oxidation of chromium was observed on the non-Cr2O3-forming Co-base alloys, whereas on the Cr2O3-forming Ni-base alloys, elimination of base-metal oxide, reduction in the Cr2O3 growth rate, and better scale adhesion were found. These effects were more apparent with pre-oxidation temperatures greater than 1000°C and with longer pretreatment times. Contaimination of Si from the quartz is believed to be the cause.
1573-4889
15734889
Springer
shingle_catch_all_4 Hou, P. Y.
Stringer, J.
Effect of internal oxidation pretreatments and Si contamination on oxide-scale growth and spalling
silicon
internal oxidation
Cr2O3, reactive-element effect
silicon
internal oxidation
Cr2O3, reactive-element effect
Abstract Internal oxidation pretreatments carried out in quartz capsule with a Rhines pack were found to have a profound effect on the subsequent oxidation behavior of alloys. Specimens of Co-15 wt.% Cr, Co-25 wt.% Cr, Ni-25 wt.% Cr, and Ni-25 wt.% Cr-1 wt.% Al were tested at 1100°C after pre-oxidation treatments. Even without the development of internal oxide particles, pretreated binary CoCr and NiCr alloys oxidized with significantly lower rates. Selective oxidation of chromium was observed on the non-Cr2O3-forming Co-base alloys, whereas on the Cr2O3-forming Ni-base alloys, elimination of base-metal oxide, reduction in the Cr2O3 growth rate, and better scale adhesion were found. These effects were more apparent with pre-oxidation temperatures greater than 1000°C and with longer pretreatment times. Contaimination of Si from the quartz is believed to be the cause.
1573-4889
15734889
Springer
shingle_title_1 Effect of internal oxidation pretreatments and Si contamination on oxide-scale growth and spalling
shingle_title_2 Effect of internal oxidation pretreatments and Si contamination on oxide-scale growth and spalling
shingle_title_3 Effect of internal oxidation pretreatments and Si contamination on oxide-scale growth and spalling
shingle_title_4 Effect of internal oxidation pretreatments and Si contamination on oxide-scale growth and spalling
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source_archive Springer Online Journal Archives 1860-2000
timestamp 2024-05-06T09:57:16.656Z
titel Effect of internal oxidation pretreatments and Si contamination on oxide-scale growth and spalling
titel_suche Effect of internal oxidation pretreatments and Si contamination on oxide-scale growth and spalling
topic ZL
uid nat_lic_papers_NLM198301227