A Compact High-Voltage Pulse Generator for Plasma Applications
| ISSN: |
1572-946X
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| Source: |
Springer Online Journal Archives 1860-2000
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| Topics: |
Physics
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| Notes: |
Abstract The design and construction of a compact high-voltage pulse generator for providing input electron beam power for the LAP/INPE 32 GHz gyrotron and for treatment of metal and polymer materials by plasma immersion ion implantation (PIII) are described. The generator was built on a circuit category of Pulse Forming Network (PFN), consisting of nine LC sections with L = 270 μH and C = 2.5 nF. The instrument was designed to produce a flat 30 kV, several Amps pulse in 15 μs pulse length with pulse repetition frequency (PRF) of 8 to 100 Hz. By means of a resonant charging inductance it is possible to gain an output voltage with a factor of 1.8 higher than the voltage supplied by the pulse generator. The generator is fed with sine-wave, constant current source, and a 60 kV, 15 mA switching power supply.
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| Type of Medium: |
Electronic Resource
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| URL: |
| _version_ | 1798296451736928257 |
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| autor | Spassov, V.A. Barroso, J. Ueda, M. Guerguiev, L. |
| autorsonst | Spassov, V.A. Barroso, J. Ueda, M. Guerguiev, L. |
| book_url | http://dx.doi.org/10.1023/A:1001123221816 |
| datenlieferant | nat_lic_papers |
| hauptsatz | hsatz_simple |
| identnr | NLM19307737X |
| issn | 1572-946X |
| journal_name | Astrophysics and space science |
| materialart | 1 |
| notes | Abstract The design and construction of a compact high-voltage pulse generator for providing input electron beam power for the LAP/INPE 32 GHz gyrotron and for treatment of metal and polymer materials by plasma immersion ion implantation (PIII) are described. The generator was built on a circuit category of Pulse Forming Network (PFN), consisting of nine LC sections with L = 270 μH and C = 2.5 nF. The instrument was designed to produce a flat 30 kV, several Amps pulse in 15 μs pulse length with pulse repetition frequency (PRF) of 8 to 100 Hz. By means of a resonant charging inductance it is possible to gain an output voltage with a factor of 1.8 higher than the voltage supplied by the pulse generator. The generator is fed with sine-wave, constant current source, and a 60 kV, 15 mA switching power supply. |
| package_name | Springer |
| publikationsjahr_anzeige | 1997 |
| publikationsjahr_facette | 1997 |
| publikationsjahr_intervall | 8004:1995-1999 |
| publikationsjahr_sort | 1997 |
| publisher | Springer |
| reference | 256 (1997), S. 533-538 |
| search_space | articles |
| shingle_author_1 | Spassov, V.A. Barroso, J. Ueda, M. Guerguiev, L. |
| shingle_author_2 | Spassov, V.A. Barroso, J. Ueda, M. Guerguiev, L. |
| shingle_author_3 | Spassov, V.A. Barroso, J. Ueda, M. Guerguiev, L. |
| shingle_author_4 | Spassov, V.A. Barroso, J. Ueda, M. Guerguiev, L. |
| shingle_catch_all_1 | Spassov, V.A. Barroso, J. Ueda, M. Guerguiev, L. A Compact High-Voltage Pulse Generator for Plasma Applications Abstract The design and construction of a compact high-voltage pulse generator for providing input electron beam power for the LAP/INPE 32 GHz gyrotron and for treatment of metal and polymer materials by plasma immersion ion implantation (PIII) are described. The generator was built on a circuit category of Pulse Forming Network (PFN), consisting of nine LC sections with L = 270 μH and C = 2.5 nF. The instrument was designed to produce a flat 30 kV, several Amps pulse in 15 μs pulse length with pulse repetition frequency (PRF) of 8 to 100 Hz. By means of a resonant charging inductance it is possible to gain an output voltage with a factor of 1.8 higher than the voltage supplied by the pulse generator. The generator is fed with sine-wave, constant current source, and a 60 kV, 15 mA switching power supply. 1572-946X 1572946X Springer |
| shingle_catch_all_2 | Spassov, V.A. Barroso, J. Ueda, M. Guerguiev, L. A Compact High-Voltage Pulse Generator for Plasma Applications Abstract The design and construction of a compact high-voltage pulse generator for providing input electron beam power for the LAP/INPE 32 GHz gyrotron and for treatment of metal and polymer materials by plasma immersion ion implantation (PIII) are described. The generator was built on a circuit category of Pulse Forming Network (PFN), consisting of nine LC sections with L = 270 μH and C = 2.5 nF. The instrument was designed to produce a flat 30 kV, several Amps pulse in 15 μs pulse length with pulse repetition frequency (PRF) of 8 to 100 Hz. By means of a resonant charging inductance it is possible to gain an output voltage with a factor of 1.8 higher than the voltage supplied by the pulse generator. The generator is fed with sine-wave, constant current source, and a 60 kV, 15 mA switching power supply. 1572-946X 1572946X Springer |
| shingle_catch_all_3 | Spassov, V.A. Barroso, J. Ueda, M. Guerguiev, L. A Compact High-Voltage Pulse Generator for Plasma Applications Abstract The design and construction of a compact high-voltage pulse generator for providing input electron beam power for the LAP/INPE 32 GHz gyrotron and for treatment of metal and polymer materials by plasma immersion ion implantation (PIII) are described. The generator was built on a circuit category of Pulse Forming Network (PFN), consisting of nine LC sections with L = 270 μH and C = 2.5 nF. The instrument was designed to produce a flat 30 kV, several Amps pulse in 15 μs pulse length with pulse repetition frequency (PRF) of 8 to 100 Hz. By means of a resonant charging inductance it is possible to gain an output voltage with a factor of 1.8 higher than the voltage supplied by the pulse generator. The generator is fed with sine-wave, constant current source, and a 60 kV, 15 mA switching power supply. 1572-946X 1572946X Springer |
| shingle_catch_all_4 | Spassov, V.A. Barroso, J. Ueda, M. Guerguiev, L. A Compact High-Voltage Pulse Generator for Plasma Applications Abstract The design and construction of a compact high-voltage pulse generator for providing input electron beam power for the LAP/INPE 32 GHz gyrotron and for treatment of metal and polymer materials by plasma immersion ion implantation (PIII) are described. The generator was built on a circuit category of Pulse Forming Network (PFN), consisting of nine LC sections with L = 270 μH and C = 2.5 nF. The instrument was designed to produce a flat 30 kV, several Amps pulse in 15 μs pulse length with pulse repetition frequency (PRF) of 8 to 100 Hz. By means of a resonant charging inductance it is possible to gain an output voltage with a factor of 1.8 higher than the voltage supplied by the pulse generator. The generator is fed with sine-wave, constant current source, and a 60 kV, 15 mA switching power supply. 1572-946X 1572946X Springer |
| shingle_title_1 | A Compact High-Voltage Pulse Generator for Plasma Applications |
| shingle_title_2 | A Compact High-Voltage Pulse Generator for Plasma Applications |
| shingle_title_3 | A Compact High-Voltage Pulse Generator for Plasma Applications |
| shingle_title_4 | A Compact High-Voltage Pulse Generator for Plasma Applications |
| sigel_instance_filter | dkfz geomar wilbert ipn albert fhp |
| source_archive | Springer Online Journal Archives 1860-2000 |
| timestamp | 2024-05-06T09:52:18.925Z |
| titel | A Compact High-Voltage Pulse Generator for Plasma Applications |
| titel_suche | A Compact High-Voltage Pulse Generator for Plasma Applications |
| topic | U |
| uid | nat_lic_papers_NLM19307737X |