The electrical strength of oxide films on metals
| ISSN: |
1573-9228
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|---|---|
| Source: |
Springer Online Journal Archives 1860-2000
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| Topics: |
Physics
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| Notes: |
Abstract Pulse breakdown of thin films is shown to be much the same as pulse breakdown in thin layers of gases and alkali halides, which means that collisional ionization is the basic process; but the relation of delay to thickness does not agree with current concepts on the breakdown mechanism in solids. It is supposed that secondary processes complicate the breakdown by collisional ionization.
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| Type of Medium: |
Electronic Resource
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| URL: |
| _version_ | 1798297228286099456 |
|---|---|
| autor | Platonov, F. S. |
| autorsonst | Platonov, F. S. |
| book_url | http://dx.doi.org/10.1007/BF00819970 |
| datenlieferant | nat_lic_papers |
| hauptsatz | hsatz_simple |
| identnr | NLM192251333 |
| issn | 1573-9228 |
| journal_name | Russian physics journal |
| materialart | 1 |
| notes | Abstract Pulse breakdown of thin films is shown to be much the same as pulse breakdown in thin layers of gases and alkali halides, which means that collisional ionization is the basic process; but the relation of delay to thickness does not agree with current concepts on the breakdown mechanism in solids. It is supposed that secondary processes complicate the breakdown by collisional ionization. |
| package_name | Springer |
| publikationsjahr_anzeige | 1967 |
| publikationsjahr_facette | 1967 |
| publikationsjahr_intervall | 8034:1965-1969 |
| publikationsjahr_sort | 1967 |
| publisher | Springer |
| reference | 10 (1967), S. 1-3 |
| search_space | articles |
| shingle_author_1 | Platonov, F. S. |
| shingle_author_2 | Platonov, F. S. |
| shingle_author_3 | Platonov, F. S. |
| shingle_author_4 | Platonov, F. S. |
| shingle_catch_all_1 | Platonov, F. S. The electrical strength of oxide films on metals Abstract Pulse breakdown of thin films is shown to be much the same as pulse breakdown in thin layers of gases and alkali halides, which means that collisional ionization is the basic process; but the relation of delay to thickness does not agree with current concepts on the breakdown mechanism in solids. It is supposed that secondary processes complicate the breakdown by collisional ionization. 1573-9228 15739228 Springer |
| shingle_catch_all_2 | Platonov, F. S. The electrical strength of oxide films on metals Abstract Pulse breakdown of thin films is shown to be much the same as pulse breakdown in thin layers of gases and alkali halides, which means that collisional ionization is the basic process; but the relation of delay to thickness does not agree with current concepts on the breakdown mechanism in solids. It is supposed that secondary processes complicate the breakdown by collisional ionization. 1573-9228 15739228 Springer |
| shingle_catch_all_3 | Platonov, F. S. The electrical strength of oxide films on metals Abstract Pulse breakdown of thin films is shown to be much the same as pulse breakdown in thin layers of gases and alkali halides, which means that collisional ionization is the basic process; but the relation of delay to thickness does not agree with current concepts on the breakdown mechanism in solids. It is supposed that secondary processes complicate the breakdown by collisional ionization. 1573-9228 15739228 Springer |
| shingle_catch_all_4 | Platonov, F. S. The electrical strength of oxide films on metals Abstract Pulse breakdown of thin films is shown to be much the same as pulse breakdown in thin layers of gases and alkali halides, which means that collisional ionization is the basic process; but the relation of delay to thickness does not agree with current concepts on the breakdown mechanism in solids. It is supposed that secondary processes complicate the breakdown by collisional ionization. 1573-9228 15739228 Springer |
| shingle_title_1 | The electrical strength of oxide films on metals |
| shingle_title_2 | The electrical strength of oxide films on metals |
| shingle_title_3 | The electrical strength of oxide films on metals |
| shingle_title_4 | The electrical strength of oxide films on metals |
| sigel_instance_filter | dkfz geomar wilbert ipn albert fhp |
| source_archive | Springer Online Journal Archives 1860-2000 |
| timestamp | 2024-05-06T10:04:39.731Z |
| titel | The electrical strength of oxide films on metals |
| titel_suche | The electrical strength of oxide films on metals |
| topic | U |
| uid | nat_lic_papers_NLM192251333 |