Comparison of Auger and SIMS analysis of a thin passive oxide film on iron - 25% chromium

Mitchell, D. F. ; Graham, M. J.

Chichester [u.a.] : Wiley-Blackwell
Published 1987
ISSN:
0142-2421
Keywords:
Chemistry ; Polymer and Materials Science
Source:
Wiley InterScience Backfile Collection 1832-2000
Topics:
Physics
Notes:
A comparison of three surface-analytical methods, viz: variable escape angle Auger electron spectroscopy, Auger sputter profiling and SIMS sputter profiling, is presented for a 1.8 nm-thick ‘passive’ oxide film on Fe-25% Cr alloy. The three techniques give identical results regarding the composition of the film as a function of depth. This means that with the proper choice of sputtering conditions (heavy ions of low energy), sputter mixing and sputter reduction are not a problem. It is evident from the experimental data that SIMS sputter profiling has the best depth resolution of the three techniques for such a thin film.
Additional Material:
2 Ill.
Type of Medium:
Electronic Resource
URL: