Low-temperature mesotaxy of ion beam synthesized ErSi2
Golanski, A. ; Park, J. L. ; Pennycook, S. J. ; White, C. W.
[S.l.] : American Institute of Physics (AIP)
Published 1991
[S.l.] : American Institute of Physics (AIP)
Published 1991
| ISSN: |
1089-7550
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|---|---|
| Source: |
AIP Digital Archive
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| Topics: |
Physics
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| Notes: |
High doses (7×1016–1.3×1017/cm2) of 170-keV Er+ ions were implanted into single-crystal Si at an implantation temperature of Ti=520 °C. During Er implantation ErSi2 crystallizes as coherent precipitates within a crystalline Si matrix. During the subsequent annealing at 800 °C a discontinuous buried layer of the single crystalline ErSi2 is formed. Implanted and annealed samples were subsequently reimplanted with 170-keV Er+ ions at 250〈Ti〈520 °C. The second implantation results in a mesotaxial growth of the previously formed buried single-crystal ErSi2 layer for implantation temperatures Ti(approximately-greater-than)300 °C where ion beam induced, defect mediated diffusion of Er atoms in the Si matrix occurs during the implantation process.
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| Type of Medium: |
Electronic Resource
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| URL: |