A study of strain in thin epitaxial films of yttrium silicide on Si(111) - Siegal, Michelle F.; Martínez-Miranda, L. J.; Santiago-Avilés, J. J.; Graham, W. R.; Siegal, M. P. (American Institute of Physics (AIP), 1994)
http://dx.doi.org/10.1063/1.356387
Keywords: U