Spatial and temperature dependence of carrier recombination in an InGaAs/InP heterostructure

Monte, A. F. G. ; da Silva, S. W. ; Cruz, J. M. R. ; Morais, P. C.

[S.l.] : American Institute of Physics (AIP)
Published 1999
ISSN:
1089-7550
Source:
AIP Digital Archive
Topics:
Physics
Notes:
The microluminescence surface scan technique has been used to investigate ambipolar carrier diffusion, photon diffusion, and photocarrier recombination in a nominally undoped InGaAs bulk layer lattice matched to InP grown by vapor levitation epitaxy. Measurements taken at different temperatures between 75 and 300 K are discussed in terms of the relative contribution of the two distinct mechanisms to the spectrally integrated luminescence intensity, namely, photon diffusion and photocarrier diffusion. © 1999 American Institute of Physics.
Type of Medium:
Electronic Resource
URL: