Nishikawa, Y., Tsuburai, Y., Nozaki, C., Ohba, Y., Kokubun, Y., & Kinoshita, H. (1988). Zn doping characteristics for InGaAlP grown by low-pressure metalorganic chemical vapor deposition. American Institute of Physics (AIP).
Chicago Style (17th ed.) CitationNishikawa, Y., Y. Tsuburai, C. Nozaki, Y. Ohba, Y. Kokubun, and H. Kinoshita. Zn Doping Characteristics for InGaAlP Grown by Low-pressure Metalorganic Chemical Vapor Deposition. Woodbury, NY: American Institute of Physics (AIP), 1988.
MLA (9th ed.) CitationNishikawa, Y., et al. Zn Doping Characteristics for InGaAlP Grown by Low-pressure Metalorganic Chemical Vapor Deposition. American Institute of Physics (AIP), 1988.
Warning: These citations may not always be 100% accurate.