Novel self-aligned W/TiN/TiSi2 contact structure for very shallow junctions and interconnections - Joshi, R. V.; Moy, D.; Brodsky, S.; Charai, A.; Krusin-Elbaum, L.; Restle, P. J.; Nguyen, T. N.; Oh, C. S. (American Institute of Physics (AIP), 1989)
http://dx.doi.org/10.1063/1.101300
Keywords: U