APA (7th ed.) Citation

Nakano, M., Sakaue, H., Kawamoto, H., Nagata, A., Hirose, M., & Horiike, Y. (1990). Digital chemical vapor deposition of SiO2. American Institute of Physics (AIP).

Chicago Style (17th ed.) Citation

Nakano, M., H. Sakaue, H. Kawamoto, A. Nagata, M. Hirose, and Y. Horiike. Digital Chemical Vapor Deposition of SiO2. Woodbury, NY: American Institute of Physics (AIP), 1990.

MLA (9th ed.) Citation

Nakano, M., et al. Digital Chemical Vapor Deposition of SiO2. American Institute of Physics (AIP), 1990.